Structural study of ZnS thin films prepared by spray pyrolysis

Afifi, Hanan H.; Mahmoud, Safwat A.; Ashour, A.

doi:10.1016/0040-6090(95)06565-2

Cited by 92 publications

(41 citation statements)

References 8 publications

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“…ZnS can be obtained as polycrystalline thin film by several deposition techniques: reactive sputtering [1], chemical vapour deposition [5], atomic layer epitaxy [6], chemical bath deposition [2,7] and spray pyrolysis [8][9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

ZnS thin films deposited by spray pyrolysis technique

Dedova

Krunks

Volobujeva

et al. 2005

phys. stat. sol. (c)

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. Hk, 78.30.Fs, 81.05.Dz, 81.15.Rs ZnS thin films were prepared by spray pyrolysis technique using aqueous solutions of zinc chloride and thiourea at molar ratio of 1:1, 1:2 and 2:1. The films were characterized by XRD, FTIR, SEM and EDX. The phase composition, structure and morphology of sprayed films are controlled by both, the substrate temperature and the precursors molar ratio in the solution. The films deposited below 380 ºC are amorphous and contain thermal decomposition residues of Zn(tu) 2 Cl 2 . Chlorine content becomes negligible at 500 ºC, carbon and nitrogen in the form of zinc cyanamide are present in a trace amount up to 540 ºC. Highly (002) orientated ZnS films with wurtzite structure and closely stoichiometric composition could be grown at temperatures close to 500 ºC using Zn:S molar ratio of 1:2 in spray solution. The film consists of well-shaped hexagonal prisms with size of 100 nm. The spray of equimolar solution (Zn:S = 1:1) results in ZnS films with smaller grain size (~25 nm) and slightly Zn-rich composition at 500 ºC. Higher temperature (530 ºC) is needed to grow the films with wurtzite structure. The use of Zn-rich (Zn/S>1) solution results in the films consisting of ZnO and ZnS phases above 400 ºC.

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Section: Introductionmentioning

confidence: 99%

ZnS thin films deposited by spray pyrolysis technique

Dedova

Krunks

Volobujeva

et al. 2005

phys. stat. sol. (c)

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“…[4] Zinc sulfide thin films have been produced by several synthetic routes, such as electron beam evaporation, [5] radio frequency (RF) sputtering, [6] pulsed laser ablation, [7] molecular beam epitaxy (MBE), [8] sol±gel, [9] and spray-pyrolysis. [10] Within this widespread scenario, the growth of ZnS thin films by CVD has attracted much attention, thanks to the possibility of tailoring the film properties by a judicious choice of precursor compound and reaction conditions. Conventional CVD processes for ZnS rely on the use of two separate sources for zinc and sulfur: Me 2 Zn and H 2 S, [1,11,12] Et 2 S, [13] or propylene sulfide.…”

Section: Introductionmentioning

confidence: 99%

Single‐Source Chemical Vapor Deposition of Zinc Sulfide‐Based Thin Films from Zinc bis(O‐ethylxanthate)

Barreca¹,

Tondello

Lydon

et al. 2003

Chemical Vapor Deposition

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A novel single-source precursor, zinc bis(O-ethylxanthate), was employed for the CVD of ZnS-based thin films. The coatings were deposited on SiO 2 and SiO 2 /Si(100) substrates in a N 2 atmosphere in a cold-wall reactor in the temperature range 250± 400 C. The optical properties of the films were investigated by ultra violet-visible (UV-vis) absorption and Fourier transform infrared (FTIR) spectroscopies. The surface and in-depth chemical composition were studied by X-ray photoelectron spectroscopy (XPS), X-ray excited Auger electron spectroscopy (XE-AES), and secondary ion mass spectrometry (SIMS). Finally, atomic force microscopy (AFM) was employed to analyze the surface morphology of the coatings. Very thin films, with thickness less than 30 nm and no evidence of crystalline phases, were grown at temperatures of at least 300 C. Optical measurement showed that the coatings were highly transparent ( > 80 %) throughout the visible and IR spectral ranges.

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“…The details of the preparation procedure and spray system were given elsewhere [5]. The spray solution used is 3 g of WCl 6 dissolved in N-dimethlyformamide.…”

Section: Methodsmentioning

confidence: 99%