2010
DOI: 10.2320/matertrans.e-m2010806
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Structural Properties of Heavily B-Doped SiGe Thin Films for High Thermoelectric Power

Abstract: Heavily B-doped SiGe thin films was reported to have large thermoelectric power and power factor at room temperature after annealing. In this paper, we investigated the structures that give rise to the large thermoelectric power and power factor. The thin films were prepared by ionbeam sputtering method. The annealing temperature dependence of structural properties was investigated. The thin films exhibited large thermoelectric power (1.4 mVK À1) and power factor (6:8 Â 10 À3 Wm À1 K À2) at room temperature af… Show more

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Cited by 25 publications
(20 citation statements)
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“…The low electrical resistivity observed in the annealed sample along with its large | S | lead to a remarkably high power factor that reaches PF ≈ 15 μW cm −1 K −2 at 300 K. This value is nearly five times larger than the reported value for optimized bulk CrN at the same temperature and comparable to the high temperature value observed in ScN and other commercial thermoelectric materials, such as B‐doped SiGe (PF ≈ 19 μW cm −1 K −2 ), and La 3 Te 4− x Pb x (PF ≈ 14 μW cm −1 K −2 at 1100 K) . The combination of this large PF and the intrinsically low thermal conductivity in RS–CrN results in a high zT = 0.12 at room temperature for the annealed sample (Figure d), which is a value similar to that shown in other state‐of‐the‐art thermoelectric materials at the same temperature .…”
mentioning
confidence: 57%
“…The low electrical resistivity observed in the annealed sample along with its large | S | lead to a remarkably high power factor that reaches PF ≈ 15 μW cm −1 K −2 at 300 K. This value is nearly five times larger than the reported value for optimized bulk CrN at the same temperature and comparable to the high temperature value observed in ScN and other commercial thermoelectric materials, such as B‐doped SiGe (PF ≈ 19 μW cm −1 K −2 ), and La 3 Te 4− x Pb x (PF ≈ 14 μW cm −1 K −2 at 1100 K) . The combination of this large PF and the intrinsically low thermal conductivity in RS–CrN results in a high zT = 0.12 at room temperature for the annealed sample (Figure d), which is a value similar to that shown in other state‐of‐the‐art thermoelectric materials at the same temperature .…”
mentioning
confidence: 57%
“…Later research by Burmistrova et al 16 have improved the power factor values to ~ (3.3-3.5) 10 -3 W/m-K 2 at 600-850K in sputter-deposited n-type ScN thin films grown on MgO substrates. These power factors at 600-850K temperature ranges are higher than those of Bi 2 Te 3 and its alloys at 400 K 2,8 , as well as the best high-temperature thermoelectric materials such as La 3 Te 4 32 at 600 K, and compare well with undoped crystalline SiGe 33 in the same temperature range. The origin of such large power factors can be explained by the changes in ScN's electronic structure with respect to the presence of point defects and impurities (such as Sc and N vacancies 34 , and doping effects of O and C on N-sites, and Ca and Ti on Sc sites on ScN's electronic structure 35 ).…”
Section: The Efficiency Of a Thermoelectric Materials Is Represented Bmentioning
confidence: 86%
“…Unfortunately, in the experiment conducted by Takiguchi et al [8], when they attempted to make Si/(Ge + B) superlattice thin film, there was no sign of the MIC effect. In fact, high thermoelectric power (>1 mVK −1 ) was observed in the superlattice thin film only when nanocrystals with a diameter less than 10 nm were present; however, limitations of the specimen preparation system and the use of B as the dopant made it difficult to prepare specimens with a precisely controlled nanostructure.…”
Section: Introductionmentioning
confidence: 99%
“…MIC is a phenomenon whereby dopant metal atoms lower the recrystallization temperature of an amorphous semiconductor [7]. This suggests that superior thermoelectric properties will arise from the nanocrystals in the amorphous matrix [8,9].…”
Section: Introductionmentioning
confidence: 99%