2008
DOI: 10.1016/j.apsusc.2008.03.023
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Structural properties of GaAs surfaces nitrided in hydrazine-sulfide solutions

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Cited by 9 publications
(12 citation statements)
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“…The nitridation of GaAs surface is carried out by its wet treatment in the solution of hydrazine‐hydrate N 2 H 4 :H 2 O with addition of 0.001M of sodium sulfide Na 2 S. [ 14,16 ] This solution is found to have an alkaline character (pH≈13) and therefore to produce the undesirable surface microetching of GaAs crystal surface. [ 32 ] To eliminate the latter, into the hydrazine‐sulfide solution the hydrazine‐dihydrochloride N 2 H 4 :2HCl is added in amount that ensures lowering pH value down to 8. [ 22 ]…”
Section: Methodsmentioning
confidence: 99%
“…The nitridation of GaAs surface is carried out by its wet treatment in the solution of hydrazine‐hydrate N 2 H 4 :H 2 O with addition of 0.001M of sodium sulfide Na 2 S. [ 14,16 ] This solution is found to have an alkaline character (pH≈13) and therefore to produce the undesirable surface microetching of GaAs crystal surface. [ 32 ] To eliminate the latter, into the hydrazine‐sulfide solution the hydrazine‐dihydrochloride N 2 H 4 :2HCl is added in amount that ensures lowering pH value down to 8. [ 22 ]…”
Section: Methodsmentioning
confidence: 99%
“…For surface nitridation of GaAs crystals, wet chemical treatment in highly alkaline (pH ∼ 12) hydrazine-sulfide is conventionally used. , However, such treatment is known to produce surface microetching, which might remove a few monolayers of the GaAs material. , To avoid microetching and to prevent possible damage to the NW surface morphology, we used a low alkaline (pH ∼ 8.5) hydrazine-sulfide solution in which concentration of the OH– anions is intentionally decreased by 4 orders of magnitude and microetching becomes nearly impossible . Preparation of the solution included the two following stages.…”
mentioning
confidence: 99%
“…This shows that OHions from the solution preferentially form bonds with surface gallium which can be subsequently desorbed, thus resulting in surface micro-etching. 9 Adsorption of OHanions is in competition with the bonding of hydrazine molecules with surface Ga atoms. In the same way as for OHadsorption, formation of a single Ga-N bond, according to Reaction (1) is reversible.…”
Section: /07/2009mentioning
confidence: 99%
“…For GaAs(001), addition of small amounts of sulfide enables the removal of surface arsenic thereby providing adsorption of the hydrazine molecules on surface Ga atoms. Soft treatments by hydrazine sulfide solutions thus lead to formation of ultra-thin, chemically stable, GaN layers which electronically and chemically passivate the surface for up to several years, 8,9 and are a potential alternative to plasma nitridation. 10,11 The chemical bonds established by the hydrazine-sulfide treatment on the (111)A and (111)B surfaces were analyzed using photoemission spectroscopy and low energy electron diffraction (LEED).…”
Section: /07/2009mentioning
confidence: 99%
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