2021
DOI: 10.1016/j.physb.2021.413126
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Structural, morphological, optical and electrical properties of the Ti doped-ZnO (TZO) thin film prepared by RF sputter technique

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Cited by 15 publications
(3 citation statements)
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“…6). Ali et al [36] found 3.255 eV for Ti-doped ZnO by the sputter deposition technique [39]. Also, it was found 3.17 and 3.30 eV for ZnO-TiO 2 composites prepared by sol-gel at 15% and 25% TiO 2 .…”
Section: Resultsmentioning
confidence: 97%
“…6). Ali et al [36] found 3.255 eV for Ti-doped ZnO by the sputter deposition technique [39]. Also, it was found 3.17 and 3.30 eV for ZnO-TiO 2 composites prepared by sol-gel at 15% and 25% TiO 2 .…”
Section: Resultsmentioning
confidence: 97%
“…This film can be doped by n-type and p-type elements in its structure. Titanium (IV), tin, and indium are some n-type doping elements [6][7][8][9][10][11]. Lithium is a p-type element with advantageous properties to be applied as a dopant, such as electrical mobility, energy harvesting, electrical resistivity, and lower charge leakage [12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Zinc oxide (ZnO) is the most popular material due to its unique properties like high optical transmittance, good transparency, high refractive index, high absorbance, high conductivity, high electron mobility, wide band gap and large exciton binding energy. [6][7][8][9][10] For this reason, it has attracted great attention in electronic and optoelectronic applications such as such as field effect transistors, capacitors, transistors, solar cells, sensors, photodetectors and light emitting diodes. Various techniques like magnetron sputtering, molecular beam epitaxy (MBE), atomic layer deposition (ALD), spray pyrolysis and sol-gel spin coating have been used to deposit ZnO film on substrate.…”
mentioning
confidence: 99%