2011
DOI: 10.1016/j.solmat.2010.07.023
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Structural, morphological, optical and electrical properties of CdTe films deposited by CSS under an argon–oxygen mixture and vacuum

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Cited by 31 publications
(9 citation statements)
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“…Meanwhile, the carrier concentration increased until 300 • C, and then declined with an increase in the deposition temperature. The films with higher carrier concentration tended to have more carrier-to-carrier scattering due to the augmented chances of carrier impacts, which resulted in lower mobility [37]. The resistivity was found in the order of 10 3 Ω cm, indicating no significant effect on resistivity by temperature during film growth.…”
Section: Hall Effect Measurementmentioning
confidence: 99%
“…Meanwhile, the carrier concentration increased until 300 • C, and then declined with an increase in the deposition temperature. The films with higher carrier concentration tended to have more carrier-to-carrier scattering due to the augmented chances of carrier impacts, which resulted in lower mobility [37]. The resistivity was found in the order of 10 3 Ω cm, indicating no significant effect on resistivity by temperature during film growth.…”
Section: Hall Effect Measurementmentioning
confidence: 99%
“…This disarrangement of lattice is created during fabrication process of a thin film [30]. Micro strain (  ) of the films was calculated to study the influence of annealing temperature using the WH plots, from the gradient of the equation (4). The calculated values for the micro strain are shown in Fig.…”
Section: °Cmentioning
confidence: 99%
“…Various techniques have been employed to deposit CdTe films, such as, closed space sublimation [4], electron beam evaporation [5], RF magneto sputtering [6], hot wall epitaxy [7], pulsed laser deposition [8], pulsed laser evaporation [9], molecular beam epitaxy [10], chemical vapor deposition [11], electrodeposition [12] and thermal evaporation [13]. Out of these methods, thermal evaporation stands out due to its low level of impurity presence in the growing layer, low trend of oxide formation, straight-line propagation of vapors from source to substrate, high deposition rate, low material consumption as well as low cost of operation.…”
Section: Introductionmentioning
confidence: 99%
“…The CdTe layer growing time was 15 min for a CdTe thickness of 1.8 ± 0.05 m and for the thickness 3.10 ± 0.05 m 30 min was used. General properties of our CSS-CdTe films were already published [12]. The CdS layers were deposited by chemical bath (CB) following a procedure already reported [13], but the solution was prepared at different molar concentrations.…”
Section: Methodsmentioning
confidence: 99%
“…For the OC measurements, graphite contacts were employed with the purpose to avoid short circuits between TCO and back contact, due to the possible presence of pinholes, since graphite paste eliminates this problem. In addition, graphite is an ohmic contact on CdTe with no thermal treatment; however, low current densities are expected due to the lack of intimate contact between CdTe and graphite paste, because of the superficial roughness of CdTe [12]. For the current-voltage measurements, Au/Cu 2 Te back contacts were evaporated following a procedure reported [14].…”
Section: Methodsmentioning
confidence: 99%