Structural modification of TiAlN coatings by preliminary Ti Ion bombardment of a steel substrate

Шугуров, А. Р.; Akulinkin, A. A.; Панин, А. В.; Перевалова, О. Б.; Сергеев, В. П.

doi:10.1134/s1063784216030191

Cited by 9 publications

(1 citation statement)

References 31 publications

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“…The Al content in Ti-Al-N coatings overcomes the oxidation problems, but a superficial Al 2 O 3 layer formed at high temperature [9][10][11]. Al 2 O 3 curbs oxygen diffusion and oxidative wear.…”

Section: Introductionmentioning

confidence: 99%

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

Obrosov

Gulyaev

Ratzke

et al. 2017

Metals

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Ti-Al-N coatings were deposited by direct current magnetron sputtering (DCMS) onto IN 718 at different nitrogen flow rates and deposition temperatures. The coatings' properties were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) as well as nanoindentation. It was found that higher deposition temperature leads to higher surface roughness and nitrogen flux influences the shape of grains. According to XPS, the bonding structure of all coatings exhibited the (Ti,Al)N phase. Mechanical properties depend on the Al content within the films. The coating with the best mechanical properties (deposited at 500 • C and 20 standard cubic centimeters per minute (sccm)) was further deposited onto tungsten carbide (WC) cutting tools for cylindrical turning experiments. A quasi-constant flank wear was observed until a machining volume of 23,500 mm 3 .

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Section: Introductionmentioning

confidence: 99%

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

Obrosov

Gulyaev

Ratzke

et al. 2017

Metals

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Bias voltage effect on magnetron sputtered titanium aluminum nitride TiAlN thin films properties

Djafer

Saoula

Wamwangi

et al. 2019

Eur. Phys. J. Appl. Phys.

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In this study, a negative substrate bias voltage is used to tune the structural, morphological, mechanical and electrochemical properties of TiAlN coatings fundamental for protective coating applications. TiAlN thin films have been deposited on glass, (001)Si and stainless steel substrates by RF magnetron sputtering at a power density of 4.41 W/cm2. The deposition rate was determined from X-ray reflectivity measurements to 7.00 ± 0.05 nm/min. TiAlN films used in this work were deposited for 60 min to yield a film thickness of 420 nm. Structural analysis has shown that TiAlN coating forms a cubic (fcc) phase with orientations in (111), (200), (220) and (222) planes. The deposited coatings present maximum hardness (H = 37.9 GPa) at −75 V. The dependence of hardness and Young's modulus and corrosion resistance on microstructure has been established. Electrochemical studies by potentiodynamic polarization in aggressive environment (3.5 wt.% NaCl) have revealed that stainless steel substrate with TiAlN coating exhibits excellent corrosion resistance.

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Fracture toughness and oxidation resistance of Ti-Al-N coatings on stainless steel substrates

Akulinkin

Шугуров

Панин

et al. 2016

AIP Conference Proceedings

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Structural modification of TiAlN coatings by preliminary Ti Ion bombardment of a steel substrate

Cited by 9 publications

References 31 publications

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

XPS and AFM Investigations of Ti-Al-N Coatings Fabricated Using DC Magnetron Sputtering at Various Nitrogen Flow Rates and Deposition Temperatures

Bias voltage effect on magnetron sputtered titanium aluminum nitride TiAlN thin films properties

Fracture toughness and oxidation resistance of Ti-Al-N coatings on stainless steel substrates

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