Structural investigation of the c(√2×5√2)R45° surface alloy formed by Ti deposition on Cu(001)

Caffio, Marco; Rovida, G.; Atrei, A.

doi:10.1016/j.susc.2006.10.016

Cited by 3 publications

(1 citation statement)

References 18 publications

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“…When the deposited metal has a higher surface energy that the substrate metal, the deposited atoms prefer to exchange with the outermost layer atoms. For example when a Ti film is grown on a Cu substrate, experiments have shown that Ti can substitute with Cu surface resulting in a first layer coverage of Ti between 20 − 30% [9].…”

Section: Introductionmentioning

confidence: 99%

Modelling thin film growth in the Ag–Ti system

et al. 2019

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Simulations of thin film growth in the Ag-Ti system are presented using molecular dynamics combined with an adaptive kinetic Monte Carlo method (AKMC) with a modified embedded atom potential fit to ab initio data for the surface energies. For the model, atoms are assumed to deposit normally with a kinetic energy of 1-3 eV, with a typical deposition rate of around 10 monolayers per second, similar to what might be expected in a sputter deposition process. For the growth of Ti on the Ag (100) and Ag (111) surfaces, the Ti adatoms prefer to exchange with the original surface layer atoms creating a mixed Ag/Ti surface. On a silver substrate, up to four mixed layers need to be formed before a pure Ti layer is obtained. Conversely, simulations of Ag depositing onto Ti (0001) showed that in the initial phase of growth, the Ag adatoms prefer to be separated before a complete first layer of Ag was obtained in a close-packed structure. The implementation of a super-basin method within AKMC allowed the simulation of 0.4s of Ti growth on the Ag substrates, with up to 3 new layers added.

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Section: Introductionmentioning

confidence: 99%

Modelling thin film growth in the Ag–Ti system

et al. 2019

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Mechanism of growth and structure of titanium oxide ultrathin films deposited on Cu(001)

et al. 2008

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Preparation, characterisation and structure of Ti and Al ultrathin oxide films on metals

Fortunelli

Granozzi

2009

International Reviews in Physical Chemistry

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The growth of ultrathin oxide films on metal substrates offers a solution to many of the experimental difficulties inherent to the studies of surfaces of bulk oxides and provides new interesting materials with unprecedented structures and properties. In this article we review the preparation and characterisation of ultrathin titanium oxide (TiOx) and aluminium oxide (AlOx) films grown on metal and metal alloy surfaces, emphasising those results that highlight new concepts and insights into metal oxide surface physics and chemistry. Different methods of preparation and characterisation are discussed and the resulting chemical compositions and surface structures are described by taking into account the results provided by computational approaches, and putting emphasis in outlining the structural novelty of interface-stabilised versus bulk-like phases and on the importance of kinetic effects in orienting the growth

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Structural investigation of the c(√2×5√2)R45° surface alloy formed by Ti deposition on Cu(001)

Cited by 3 publications

References 18 publications

Modelling thin film growth in the Ag–Ti system

Modelling thin film growth in the Ag–Ti system

Mechanism of growth and structure of titanium oxide ultrathin films deposited on Cu(001)

Preparation, characterisation and structure of Ti and Al ultrathin oxide films on metals

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