Structural investigation of Al₂O₃ coatings by PECVD with a high deposition rate

Abstract

The deposition of alumina on thermal barrier coatings can effectively avoid hot corrosion and increase durability. Al 2 O 3 coatings were prepared on an yttria-stabilized zirconia (YSZ) substrate by plasma chemical vapor deposition (CVD). The effects of microwave power (P M ) and total pressure (P tot ) on the crystalline phase and microstructure of Al 2 O 3 coatings were investigated, and the effect of the mechanism on the deposition rate was also analyzed. The α-Al 2 O 3 coatings with a needle-like microstructure were formed at a higher P M and P tot , whereas the γ-phase coatings exhibited a cauliflower-like microstructure at a lower P M and P tot . A maximum deposition rate (R dep ) of 58 μmh −1 was obtained, which is significantly higher than those of conventional CVD methods. K E Y W O R D S alumina, chemical vapor deposition, coatings | 1357 ZHANG et Al. How to cite this article: Zhang S, Zheng L, Wei G, et al. Structural investigation of Al 2 O 3 coatings by PECVD with a high deposition rate. Int J Appl Ceram

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