Structural features of vacuum-deposited high-hardness chromium coatings

Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films

“…Typical values reported in the literature, shown in Table 1 relate to the microhardness of films. For arc evaporated Cr films values between 8 and 16 GPa were reported [14]. For dc pulse sputtered CrN films [6], arc evaporated CrN films [15] and arc ion-plated CrN films [16] the reported microhardness is in the interval between 16 GPa and 31 GPa.…”