2010
DOI: 10.1143/jjap.49.050203
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Structural Elements of Ultrashallow Thermal Donors Formed in Silicon Crystals

Abstract: It has been reported by one of the authors (A.H.) of the present study that ultrashallow thermal donors (USTDs) with a hydrogen-like electronic structure are formed in C- and N-doped O-rich Si crystals at approximately 450–600 °C. In this paper, it is reported that there are two types of USTDs: USTDs comprising C, H, and O [D(C,H,O)s] and USTDs comprising C, N, and O [D(C,N,O)s]. The thermal stability of these two types of donors was different; D(C,N,O)s were stable at 600 °C, while D(C,H,O)s were not stable a… Show more

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Cited by 3 publications
(11 citation statements)
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“…2. 10,18,19) We observed new broad peaks, labeled A, B, and C in Fig. 1, as the temperature was increased to a higher range (20-50 K), despite the decreases in USTD and STD(H) intensities.…”
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confidence: 88%
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“…2. 10,18,19) We observed new broad peaks, labeled A, B, and C in Fig. 1, as the temperature was increased to a higher range (20-50 K), despite the decreases in USTD and STD(H) intensities.…”
mentioning
confidence: 88%
“…[6][7][8][9] In addition, a new type of shallow donor has been found in Si containing oxygen, nitrogen, and carbon. 10) Hydrogen is also an important element in Si-LSI circuits and solar cells, because various reactive gases including hydrogen are used in the thin-film growth process. Hydrogen is also important in the passivation and activation of impurities and defects.…”
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confidence: 99%
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“…Table I shows the peak positions observed in the Ref. 10, which correspond to USTDs-1 to -5 in Ref. 1, hydrogen-related thermal donors [STD(H)s]-2 and -3, and USTDs-1A and -2A.…”
Section: Introductionmentioning
confidence: 99%