2009
DOI: 10.1007/s00339-009-5317-9
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Structural, electrical and optical properties of boron doped ZnO thin films using LSMCD method at room temperature

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Cited by 47 publications
(17 citation statements)
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“…In addition, such preferred basal orientation is typically observed in the previously reported Al-doped ZnO films for doping ranges 1-4 at% and 1-5 at%, and the substrate temperature of 450 1C [33,34]. Furthermore, our results agree well with previously reported studies [35][36][37].…”
Section: Xrd Studies Of Zno and B F-zno Thin Filmssupporting
confidence: 92%
“…In addition, such preferred basal orientation is typically observed in the previously reported Al-doped ZnO films for doping ranges 1-4 at% and 1-5 at%, and the substrate temperature of 450 1C [33,34]. Furthermore, our results agree well with previously reported studies [35][36][37].…”
Section: Xrd Studies Of Zno and B F-zno Thin Filmssupporting
confidence: 92%
“…The same tendency was also observed by Kim et al [14]. It was seen that boron doping resulted in an interstitial inclusion of dopant atoms, which resulted in a deterioration of the film structure.…”
Section: Structural Properties Of the Undoped And Boron Doped Nanostrsupporting
confidence: 84%
“…Although there is not too much works about boron doped ZnO films [14][15][16][17][18], there is only a few study related to boron doped ZnO deposited by sol-gel method in among of them. Tahar and Tahar [19] used sol-gel dip coating method and investigated the electrical and optical properties of multilayer transparent conducting boron doped ZnO films according to various deposition parameters.…”
Section: Introductionmentioning
confidence: 99%
“…In the case of B doping (which is trivalent), the concentration of the zinc interstitials is reduced for charge compensation, resulting in suppressed ZnO grain growth and deteriorated crystallinity [25]. The similar XRD features for B doped ZnO films have been observed by Addonizio and Diletto [17] using low-pressure metalorganic chemical vapor deposition (LP-MOCVD) technique and Kim et al [26] using liquid source misted chemical vapor deposition (LSMCD) method.…”
Section: Structural and Morphological Properties Of The Undoped And Bmentioning
confidence: 52%
“…It is seen that the intensities of (0 0 2) peaks decrease with increasing doping ratio. When differently sized atoms are substituted in the ZnO lattice, some lattice defects and distortion of the crystal lattice may occur [26]. The XRD result suggests that the incorporation of boron atoms leads to a suppression of the crystal growth along the c-axis.…”
Section: Structural and Morphological Properties Of The Undoped And Bmentioning
confidence: 99%