Structural, electrical and optical analysis of ITO thin films prepared by sol–gel

The effect of solvents and the thickness on structural, optical and electrical properties of ITO thin films prepared by a sol–gel spin-coating process

“…The deposition of TCOs on the substrate can be made using several physical or chemical methods, such as spincoating [8], magnetron sputtering [9], chemical vapor deposition (CVD) [10], vacuum evaporation [11], reaction evaporation [12] and the sol-gel process [6,[13][14][15][16][17][18][19]. The sol-gel method has several advantages, including simplicity, low cost, easily controlled doping levels and feasible preparation of large area films [6].…”

Structural and photoluminescence properties of SnO2:Ga films deposited on α-Al2O3 (0001) by MOCVD

“…Transparent conducting oxide films (TCOs) have been studied for many years due to their low resistivity [1] and high optical transparency [2] in the visible region. Among the available TCOs, SnO 2 films have been widely used as transparent conducting electrodes in many optoelectronic and electro-optic devices such as solar cells and flat panel displays.…”

Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films

“…Among these methods, we can cite the conventional e-beam evaporation [8], the reactive e-beam evaporation [9], the dc sputtering [10,11], the rf sputtering [12,13], the spray pyrolysis technique [14], sol-gel [15,16] and pulsed laser deposition [17]. These studies have shown that the physical properties of ITO films depend greatly on the method and conditions of deposition.…”