Structural characterization of V2O5–TiO2 thin films deposited by RF sputtering from a titanium target with vanadium insets

Alessandri, Ivano; Comini, Elisabetta; Bontempi, Elza; Depero, Laura E.

doi:10.1016/j.snb.2005.03.080

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Thin Films and Coatings1

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2006

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Cited by 7 publications

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“…EPMA showed that the surface of the film was Cu-rich and XRD confirmed that some films had a chalcopyrite structure whilst others also contained a ''foreign'' phase. Structural characterisation of V 2 O 5 -TiO 2 thin films deposited by rf sputtering from a titanium target with a vanadium inset was reported by Alessandri et al 398 using mXRF. The V/Ti atomic ratio of samples treated at 300 1C was found to be 0.18, 0.25 and 0.82.…”

Section: Thin Films and Coatingsmentioning

confidence: 83%