2008
DOI: 10.1016/j.jcrysgro.2007.10.084
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Structural characterization of TiO2 films grown on LaAlO3 and SrTiO3 substrates using reactive molecular beam epitaxy

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Cited by 37 publications
(31 citation statements)
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“…1(f) shows a HRTEM image of the anatase TiO 2 -LaAlO 3 interface with the corresponding electron diffraction patterns as insets. The following orientation relationship is seen, that is (0 0 1) (0 1 0) A //(0 0 1)(0 1 0) L , consistent with the previous work [33], where the subscripts A and L represent the anatase TiO 2 and the LaAlO 3 phases respectively. Besides, in the image of Fig.…”
Section: Characteristics Of Tio 2 Filmssupporting
confidence: 90%
“…1(f) shows a HRTEM image of the anatase TiO 2 -LaAlO 3 interface with the corresponding electron diffraction patterns as insets. The following orientation relationship is seen, that is (0 0 1) (0 1 0) A //(0 0 1)(0 1 0) L , consistent with the previous work [33], where the subscripts A and L represent the anatase TiO 2 and the LaAlO 3 phases respectively. Besides, in the image of Fig.…”
Section: Characteristics Of Tio 2 Filmssupporting
confidence: 90%
“…This brings a natural question: what would be the effect on the band alignment of an interfacial O vacancy? [75] Here we only consider a neutral vacancy. There are four types of interfacial O ions as shown in Fig.…”
Section: Oxygen Vacancy and Fluorine Impurity At The Tio 2 /Srtio 3 Imentioning
confidence: 99%
“…1. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] Of the preceding, the methods for chemical vapor deposition (CVD) are the best known and most widely used thin film fabrication techniques [16][17][18][19] largely because, in addition to the abovementioned advantages, they are adapted easily to the coating of large surfaces. [20][21][22][23] CVD methods also have the advantage that they can be used both with and without a vacuum system, [24][25][26][27] which is not the case with physical vapor deposition (PVD) methods, which require vacuum conditions.…”
Section: Introductionmentioning
confidence: 99%