2010
DOI: 10.1016/j.jcrysgro.2009.12.048
|View full text |Cite
|
Sign up to set email alerts
|

Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
6
0

Year Published

2010
2010
2022
2022

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 16 publications
(6 citation statements)
references
References 48 publications
(58 reference statements)
0
6
0
Order By: Relevance
“…It is well established that, due to its metastable nature, a pure zincblende GaN phase is difficult to grow without the appearance of small inclusions of a wurtzite GaN phase. [16][17][18] The two subsidiary peaks were then tentatively attributed to reflections from hexagonal GaN. Based on the bulk values of the lattice parameters for h-GaN, a ¼ 3.1879 Å and c ¼ 5.1856 Å , 19 peaks at 2h ¼ 37.25 and 2h ¼ 79.35 can be ascribed to the reflection of the wurtzite plane ð10 11Þ and ð20 22Þ, respectively.…”
Section: Resultsmentioning
confidence: 98%
“…It is well established that, due to its metastable nature, a pure zincblende GaN phase is difficult to grow without the appearance of small inclusions of a wurtzite GaN phase. [16][17][18] The two subsidiary peaks were then tentatively attributed to reflections from hexagonal GaN. Based on the bulk values of the lattice parameters for h-GaN, a ¼ 3.1879 Å and c ¼ 5.1856 Å , 19 peaks at 2h ¼ 37.25 and 2h ¼ 79.35 can be ascribed to the reflection of the wurtzite plane ð10 11Þ and ð20 22Þ, respectively.…”
Section: Resultsmentioning
confidence: 98%
“…The choice of substrate is vital to ensure zincblende GaN growth. The main substrates that have been studied include cubic GaAs (001) (by MBE [10][11][12][13][14] and MOVPE [15][16][17][18][19][20][21]), 3C-SiC (by MBE [22][23][24][25][26] and MOVPE [27]), 3C-SiC on Si by MBE [28][29][30][31][32][33], patterned 3C-SiC on Si [34] and patterned Si [35][36][37] substrates. Some of the substrate properties to consider are lattice matching and difference in thermal expansion coefficient with zincblende GaN and cost.…”
Section: Zincblende Gan Growth Methodsmentioning
confidence: 99%
“…The commercial viability of zincblende GaN LEDs grown on such substrates is also increased by the availability of large area (up to 8 inches in diameter) Si substrates. 3C-SiC layers have been grown on silicon by chemical vapour deposition [32], carbonising with a carbon-containing gas such as C 2 H 2 [39,40], carbonisation in rapid thermal processing reactor [31] and high-dose carbon ion implantation [33]. More recently, Stark et al [35] and Bayram et al [36] have both used patterned Si substrates with {111} side walls, although in slightly different geometries.…”
Section: Zincblende Gan Growth Methodsmentioning
confidence: 99%
“…The 3C-SiC layer is then brought to the surface by ion beam amorphization of the top silicon layer and a part of the buried SiC layer. Wet chemical etching removes the amorphized layers and leads to surfaces sufficiently smooth for epitaxial growth of GaN by ion beam assisted MBE [8]. From previous X-ray diffraction experiments on www.pss-c.com…”
Section: Methodsmentioning
confidence: 99%