Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films

Kacim, S.; Delcambe, P.; Binst, L.; Jardinier‐Offergeld, M.; Bouillon, Florent

doi:10.1016/0040-6090(94)90753-6

Cited by 8 publications

(1 citation statement)

References 19 publications

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“…Steered arc deposition (SAD) [24], thermal evaporation [25] or electron beam evaporation [9,16,24,26,27] and finally chemical methods like CVD or low pressure chemical vapor deposition (LPCVD) [28] also have been reported. The paper is organized as follows.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the Properties of Molybdenum Nanocube Crystals Deposited by Dc Sputtering

Borghei

2016

Acta Phys. Pol. A

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Cubic molybdenum (Mo) nanocubes were deposited on a silicon substrate via dc sputtering. This method has been widely used to prepare the thin films containing the crystalline nanostructures. We used this approach to deposition and after that, the characterization of Mo nanocubes. Formation of these cubes was investigated by atomic force microscopy, X-ray diffractometry and four point probes, respectively. First, the mean sizes of the molybdenum cubic nanoparticles were studied under different Mo film thicknesses of 50, 80, 110, and 140 nm. Structural characterizations indicate that the as-deposited Mo nanocubes have different side-length and their distribution over the surface has been measured, separately. In the next step, according to the X-ray diffractometry, Mo crystallites were all along the (110) crystal planes of cubic structure. Finally, electrical characterizations reported that at a deposition power of 54 W, our samples exhibit an electrical resistivity, in the range of 0.92 × 10 −4 Ω cm to 0.58 × 10 −4 Ω cm.

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