Investigation of the Properties of Molybdenum Nanocube Crystals Deposited by Dc Sputtering

Abstract

Cubic molybdenum (Mo) nanocubes were deposited on a silicon substrate via dc sputtering. This method has been widely used to prepare the thin films containing the crystalline nanostructures. We used this approach to deposition and after that, the characterization of Mo nanocubes. Formation of these cubes was investigated by atomic force microscopy, X-ray diffractometry and four point probes, respectively. First, the mean sizes of the molybdenum cubic nanoparticles were studied under different Mo film thicknesses of 50, 80, 110, and 140 nm. Structural characterizations indicate that the as-deposited Mo nanocubes have different side-length and their distribution over the surface has been measured, separately. In the next step, according to the X-ray diffractometry, Mo crystallites were all along the (110) crystal planes of cubic structure. Finally, electrical characterizations reported that at a deposition power of 54 W, our samples exhibit an electrical resistivity, in the range of 0.92 × 10 −4 Ω cm to 0.58 × 10 −4 Ω cm.

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“…The XRD pattern depicted in Figure S10A shows diffraction peaks, which indicated the orthorhombic crystal structure of the MoO 3 NCs, with well-defined diffraction peaks clearly established according to the (020), ( 040), (010), and (810) faces of crystalline Mo. 48,49 The magnetic constituents exhibit marked indices at (311), (400), and (440). 47 Moreover, the Raman spectra of mag-MoO 3 NCs shown in Figure S10B displayed typical Mo 3 −O and Mo 2 −O vibrations at 776 and 820 cm −1 , respectively, which can be attributed to the Mo component of the NCs.…”