Structural and optical properties of Co-doped NiO films prepared by SILAR method

Taşköprü, T.; Bayansal, F.; Şahin, Bünyamin; Zor, Muhsin

doi:10.1080/14786435.2014.984788

Cited by 51 publications

(11 citation statements)

References 24 publications

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“…In step 1, the substrate is immersed in a sol with a Ni 2+ complexed with NH 3 . The Ni 2+ can be from NiCl 2 or Ni(NO 3 ) 2 .6H 2 O, and these are reacted with concentrated ammonia 134‐136 . In the first step, the immersion time is 20 to 30 seconds 134‐136 .…”

Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 99%

“…The Ni 2+ can be from NiCl 2 or Ni(NO 3 ) 2 .6H 2 O, and these are reacted with concentrated ammonia. [134][135][136] In the first step, the immersion time is 20 to 30 seconds. [134][135][136] In step 2, the substrate is withdrawn and immersed in hot deionized water.…”

Section: Successive Ionic Layer Adsorption and Reactionmentioning

confidence: 99%

“…[134][135][136] In the first step, the immersion time is 20 to 30 seconds. [134][135][136] In step 2, the substrate is withdrawn and immersed in hot deionized water. The temperature is usually 90 C and immersion time 7 to 20 seconds.…”

Section: Successive Ionic Layer Adsorption and Reactionmentioning

confidence: 99%

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Napari

Huq

Hoye

et al. 2020

InfoMat

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Nickel oxide (NiOx), a p‐type oxide semiconductor, has gained significant attention due to its versatile and tunable properties. It has become one of the critical materials in wide range of electronics applications, including resistive switching random access memory devices and highly sensitive and selective sensor applications. In addition, the wide band gap and high work function, coupled with the low electron affinity, have made NiOx widely used in emerging optoelectronics and p‐n heterojunctions. The properties of NiOx thin films depend strongly on the deposition method and conditions. Efficient implementation of NiOx in next‐generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material, but which are also compatible with flexible substrates. In this review, we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films, and with its application in electronic devices. We focus solely on thin films, rather than NiOx incorporated with one‐dimensional or two‐dimensional materials. This review starts by discussing how the p‐type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties. We discuss the chemical deposition techniques for growing NiOx thin films, including chemical vapor deposition, atomic layer deposition, and a selection of solution processing approaches, and present examples of recent progress made in the implementation of NiOx thin films in devices, both on rigid and flexible substrates. Furthermore, we discuss the remaining challenges and limitations in the deposition of device‐quality NiOx thin films with chemical growth methods.

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Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 99%

Section: Successive Ionic Layer Adsorption and Reactionmentioning

confidence: 99%

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

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Huq

Hoye

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“…22,23 Doping of different metallic ions and formation of binary mixed metals/metal oxides improves the electric, magnetic, electrochromic and catalytic properties of ZnO. [24][25][26][27]106 For the resolution of the challenges associated with ZnO utilization, manganese and manganese-based catalysts are gaining thrust for application in catalytic and fuel cell devices. This is due to their low cost and improved activity compared to Pt-based rare earth metals.…”

Section: Introductionmentioning

confidence: 99%

Organic template-based ZnO embedded Mn₃O₄ nanoparticles: synthesis and evaluation of their electrochemical properties towards clean energy generation

et al. 2020

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To deal with fossil fuel depletion and the rise in global temperatures caused by fossil fuels, cheap and abundant materials are required, in order to fulfill energy demand by developing high-performance fuel cells and electrocatalysts. In this work, a natural organic agent has been used to synthesize nanostructured ZnO/Mn 3 O 4 with high surface area and enhanced electrocatalytic performance. Upon preannealing treatment, mixed metal oxide precipitates are formed due to the complex formation between a metal oxide and organic extract. The thermally annealed mixed oxide ZnO/Mn 3 O 4 was characterized by XRD diffractometer, Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDX). Gas chromatography-mass spectrometry (GC-MS) identified methyldecylamine as a major stabilizing agent of the synthesized nanomaterial. Using a Tauc plot, the calculated band energy for the synthesized ZnO/Mn 3 O 4 mixed metal oxide was 1.65 eV.Moreover, we have demonstrated the effects of incorporated organic compounds on the surface chemistry, morphology and electrochemical behavior of ZnO/Mn 3 O 4 . The phyto-functionalized ZnO/ Mn 3 O 4 was deposited on Ni-foam for electrocatalytic studies. The fabricated electrode revealed good performance with low over-potential and Tafel slope, suggesting it to be suitable as a potential catalyst for water splitting application, in particular for the oxygen evolution reaction (OER). The overall findings of the current study provide a cost-effective and efficient organic template for functionalization and sustainable fabrication of ZnO/Mn 3 O 4 nanomaterial for application as an electrocatalyst.

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“…Günümüzde, NiO filmleri elde etmek için sol-gel [11], PLD (pulsed laser deposition) [12], buharlaştırma (evaporation) [13], saçtırma (sputtering) [14], SILAR (Successive Ionic Layer Adsorption and Reaction) [15], spray pyrolysis [16] ve elektrodepozisyon [17]- [20]…”

Section: Introductionunclassified

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

Demir¹

2018

Pamukkale J Eng Sci

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ITO altlık üzerine geçirgen NiO (nikel oksit) ince filmler farklı katodik akımlarda elektrokimyasal büyütme tekniği ile büyütülmüştür. Büyütme sonrası filmler 350 °C'de hava ortamında 2 sa. tavlanmıştır. Xışını kırınım (XRD) örnekleri altlık üzerine büyütülen filmlerin ( 111), ( 200) ve ( 222) yönelimlere sahip tek fazlı kübik yapılı polikristal olduklarını göstermiştir. Soğurma ölçümleriyle büyütülen NiO filmlerin band aralığı 2.85 eV olarak hesaplanmıştır. 310-800 nm aralığında alınan Fotolüminesans (PL) ölçümlerinden NiO ince filmlerin üç emisyon pikine sahip olduğu görülmüştür. Taramalı elektron mikroskobu (SEM) ve atomik kuvvet mikroskobu (AFM) ile büyütülen filmlerin yüzey morfolojisi incelenmiştir. Fourier Dönüşümlü İnfrared Spektroskopi (FTIR) analizleriyle filmlerin oluşumunda Ni-O bağların titreşim modlarına sahip olduğu ortaya çıkarılmış ve filmlerin görünür bölgede %50 ile %80 arasında ortalama bir optik geçirgenliğe sahip olduğu görülmüştür. XPS ölçümleri Ni/O yönelimi ve farklı büyütme koşullarına bağlı olarak büyütülen NiO filmlerin kimyasal bağlanma durumları gibi kimyasal özelliklerini incelemek için gerçekleştirilmiştir. Raman ölçümleri elektrokimyasal olarak büyütülen NiO filmlerinin stokiyometrik olmadığını göstermiştir. Görüldüğü gibi, NiO nanoparçacıkların yoğunluğu ve morfolojisinin optoelektronik aygıtların oluşumunda oldukça önemli olduğu anlaşılmıştır.Transparent NiO thin films were growth in different cathodic currents by using electrochemical deposition technique on ITO substrates. After deposition, thin films were annealed at 350° for 2 hours in air environment. X-ray diffraction (XRD) patterns indicated that thin films growth on substrates have a single-phased cubic polycrystalline structure with orientations of ( 111), ( 200) and ( 222). Band gap of NiO films growth by using absorption measurements were calculated as 2.85 eV. The data obtained from the measurements of photoluminescence (PL) carried out between 310-800 nm, indicated that NiO thin films have three emission peaks. NiO thin films growth were investigated from the point of surface morphology by scanning electron microscopy (SEM) and atomic force microscopy (AFM). It has been revealed that there are the vibrational modes of Ni-O bonds in the formation of the films with Fourier transform infrared spectroscopy (FTIR) analysis and showed that the films have an average optical transmittance between 50% and 80% in the visible region. XPS measurements were studied to examine the chemical features as chemical bonding states of the NiO films deposited depending on Ni/O orientation and different conditions. Raman measurements displayed that the growth NiO films have not a stoichiometric nature. As seen, it has been understood that the density and morphology of NiO particles are very important in the formation optoelectronic devices.

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Structural and optical properties of Co-doped NiO films prepared by SILAR method

Cited by 51 publications

References 24 publications

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Organic template-based ZnO embedded Mn₃O₄ nanoparticles: synthesis and evaluation of their electrochemical properties towards clean energy generation

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

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Structural and optical properties of Co-doped NiO films prepared by SILAR method

Cited by 51 publications

References 24 publications

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Organic template-based ZnO embedded Mn3O4 nanoparticles: synthesis and evaluation of their electrochemical properties towards clean energy generation

Characterization and Preparation of Transparent NiO Thin Films Growth by Electrochemical Deposition Technique

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Organic template-based ZnO embedded Mn₃O₄ nanoparticles: synthesis and evaluation of their electrochemical properties towards clean energy generation