2018
DOI: 10.1016/j.apsusc.2018.01.277
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Structural and magnetic properties of near surface superparamagnetic Ni1-Fe nanoparticles in SiO2 formed by low energy dual ion implantation with different fluences

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Cited by 6 publications
(3 citation statements)
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“…The coercive field is 31 mT at 5 K and 12 mT at 300 K. The appearance of hysteresis at 300 K indicates that there are some nanoparticles that are too big to be superparamagnetic. While the ~5 nm nanoparticles are small enough to exhibit superparamagnetism [24,46,62], the ~35 nm nanoparticles are too large, and it is the larger nanoparticles that lead to hysteresis even at 300 K. The coercive field at 300 K is higher than that reported in bulk unannealed Ni (3 mT) [63] and Ni nanofibres [61]. However, it is similar to that reported for Ni 1-x Fe x nanoparticles with x = 0.2 and diameters of ~15 nm (12 mT) [54,57] and x = 0.25 with diameters of 23 nm (~10 mT) [58].…”
Section: Resultsmentioning
confidence: 99%
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“…The coercive field is 31 mT at 5 K and 12 mT at 300 K. The appearance of hysteresis at 300 K indicates that there are some nanoparticles that are too big to be superparamagnetic. While the ~5 nm nanoparticles are small enough to exhibit superparamagnetism [24,46,62], the ~35 nm nanoparticles are too large, and it is the larger nanoparticles that lead to hysteresis even at 300 K. The coercive field at 300 K is higher than that reported in bulk unannealed Ni (3 mT) [63] and Ni nanofibres [61]. However, it is similar to that reported for Ni 1-x Fe x nanoparticles with x = 0.2 and diameters of ~15 nm (12 mT) [54,57] and x = 0.25 with diameters of 23 nm (~10 mT) [58].…”
Section: Resultsmentioning
confidence: 99%
“…Ni 1-x Fe x is interesting because bulk Ni 1− x Fe x is used in magnetic flux guiding applications [45]. It can have a very low magnetocrystalline anisotropy for x~0.26 and hence Ni 1-x Fe x nanoparticles with sizes up to ~60 nm could potentially have a T B lower than 300 K and magnetic susceptibilities > 1000 [46].…”
Section: Introductionmentioning
confidence: 99%
“…TEM would be a suitable characterisation technique to complement XRD to verify he nature of the crystal structure post-implantation and should be performed in future work related to this project. It has been reported by Williams et al that clusters of metal precipitate in the top layer of the film, followed by a region immediately below with a lower concentration, have been observed for low energy (10 keV) implantation of Ni + into SiO2 at 4 x 10 16 ions/cm 2 [60]. It is worth pointing out that the 2𝜃 002 peak for wurtzite-ScxAl1-xN alloys has been reported at similar values for AlN for various concentrations, x = 0.06 [61,62] and 0 < x < 0.30 [10], therefore it is also possible that at the high fluences, the concentration of Sc may be high enough for alloying to occur, however TEM is needed to verify this for our films.…”
Section: Current-voltage Measurementsmentioning
confidence: 93%