2013
DOI: 10.1063/1.4795440
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Stress-mediated magnetoelectric memory effect with uni-axial TbCo2/FeCo multilayer on 011-cut PMN-PT ferroelectric relaxor

Abstract: We present here the implementation of a magnetoelectric memory with a voltage driven writing method using a ferroelectric relaxor substrate. The memory point consists of a magnetoelastic element in which two orthogonal stable magnetic states are defined by combining uni-axial anisotropy together with a magnetic polarization in the hard axis direction. Using a ferroelectric relaxor substrate, an anisotropic stress is created in the magnetic element when applying a voltage across electrodes. Because of the inver… Show more

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Cited by 43 publications
(28 citation statements)
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References 16 publications
(13 reference statements)
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“…Whereas, if the magnetostriction effect of FM subsystem is induced by the interface strain, the strainmediated magnetoelectric interaction would play a dominant role in the CME. [11][12][13] In experiment, due to the piezoelectric effect of the ferroelectric relaxor substrate, 14 an anisotropic stress can be created in the FM film by applying voltage across the heterostructure. Consequently, we have an electric control of uniaxial magnetic anisotropy, which is the key issue for the future development of low-power spintronic devices based on the CME.…”
mentioning
confidence: 99%
“…Whereas, if the magnetostriction effect of FM subsystem is induced by the interface strain, the strainmediated magnetoelectric interaction would play a dominant role in the CME. [11][12][13] In experiment, due to the piezoelectric effect of the ferroelectric relaxor substrate, 14 an anisotropic stress can be created in the FM film by applying voltage across the heterostructure. Consequently, we have an electric control of uniaxial magnetic anisotropy, which is the key issue for the future development of low-power spintronic devices based on the CME.…”
mentioning
confidence: 99%
“…For the multilayers consisting of PZT and PZN-PT, the E-related K eff may be expressed by Eqs. (8) and (9), respectively,…”
Section: Resultsmentioning
confidence: 98%
“…The different normalized remanent magnetization of 30% and 73% are obtained after applying two different E-field pulses (5kV/cm and -2kV/cm), suggesting the E-field induced magnetization switching is nonvolatile. Combined with the large AMR effect in CoNi thin films, the E-field induced magnetization switching paves a new way for fabrication of voltage-write magnetic random memory devices [19], [20]. …”
Section: Resultsmentioning
confidence: 99%