Abstract:Homojunction, graded bandgap
normalGaAlAs:normalSi
LED's have been demonstrated to be highly reliable. During accelerated aging (30 mA forward bias, 250°C), these LED's generally degrade slowly without the formation of dark lines or dark spots. It has recently been found, however, that some LED's show a rapid reduction of light output even when aged without current bias at 200°C. <110> oriented dark lines appeared in the electroluminescence image of heavily degraded devices. To determine the source of the DL… Show more
“…In x Ga 1−x As is one of the most important series of semiconductor materials and it is used for the fabrication of optoelectronic devices, such as, thermo-photo-voltaic cells, detectors, etc in the near infrared region [4][5][6][7].…”
A study of the liquid phase epitaxial growth of In x Ga 1−x As (x = 0.06) layers on different types of patterned GaAs(100) substrates has been carried out. The dependence of growth morphology on the stripe orientation of the star patterned trench substrate has been observed. Pyramid layers were grown in the stripes oriented along the 001 direction. Broken tent structures formed along the 012 direction. Pyramidal structured layers looked to grow faster than the tent-like and broken tent-like structures. In order to analyse the hollow pyramid structure growth in detail, they were grown on circular trench substrates for different periods of time. Hollow pyramidal structures of InGaAs have been grown on circular patterned trench substrates. Effective defect filtration can be realized in this kind of growth of hollow pyramidal structures. The formation mechanism of the hollow pyramid structured layers has been studied in detail.
“…In x Ga 1−x As is one of the most important series of semiconductor materials and it is used for the fabrication of optoelectronic devices, such as, thermo-photo-voltaic cells, detectors, etc in the near infrared region [4][5][6][7].…”
A study of the liquid phase epitaxial growth of In x Ga 1−x As (x = 0.06) layers on different types of patterned GaAs(100) substrates has been carried out. The dependence of growth morphology on the stripe orientation of the star patterned trench substrate has been observed. Pyramid layers were grown in the stripes oriented along the 001 direction. Broken tent structures formed along the 012 direction. Pyramidal structured layers looked to grow faster than the tent-like and broken tent-like structures. In order to analyse the hollow pyramid structure growth in detail, they were grown on circular trench substrates for different periods of time. Hollow pyramidal structures of InGaAs have been grown on circular patterned trench substrates. Effective defect filtration can be realized in this kind of growth of hollow pyramidal structures. The formation mechanism of the hollow pyramid structured layers has been studied in detail.
“…1991. Panchromatic cathodoluminescence (PCL) has been extensively employed in the characterization of semiconducting bulk single crystals (Brown et af., 1983, Chin et al 1979a,b,c, Chin et al 1980, Chin et al 1981, Chin er a/. 1982, Chin 1982a,b, Chu et al 1981, Cocito et al 1982, Cocito et al 1983, Fornari et 01.…”
Some examples of the possibilities that panchromatic cathodoluminescence (PCL) offers in the scanning electron microscopy (SEM) characterization of III‐V semiconductors are presented. Investigations on lattice‐mismatched InGaAs/InP, InGaAs/ GaAs single heterostructures, and InGaAs/GaAs superlattices and GaAs/Ge and GaAs/InP single layers are shown. Further, the use of PCL as a support in the nondestructive determination of the sensitivity limit of Rutherford backscattering and x‐ray diffraction techniques in the study of strain release in some of the above mentioned heterostructures is presented. Finally, PCL on‐line study of dislocation movement induced by electron beam irradiation in the SEM, as evidence of InGaAs/GaAs superlattice metastability, is also presented.
The EPD distribution is investigated in silicon-doped LEC-grown gallium arsenide crystals, 30 f 40 mni in mainbotly diameter and weighing within 300 t 500 grams. The silicondoping-dependent hardening effect, previously observed in S-doped and Bridgman grown silicon-doped gallium arsenide is here confirmed. The EPD decreasing with silicon-doping increase is observed to be less pronounced than in the case of S-doped and Bridgmarr grown silicon-doped samples and possible reasons for this different behaviour are diecussed. I n any case, a large microprecipitate density together with the EPD reduction appears as a clustering of shallow-pits around dislocation pits.
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