We demonstrate the controlled preparation of heteroepitaxial diamond nano-and microstructures on silicon wafer based iridium films as hosts for single color centers. Our approach uses electron beam lithography followed by reactive ion etching to pattern the carbon layer formed by bias enhanced nucleation on the iridium surface. In the subsequent chemical vapor deposition process, the patterned areas evolve into regular arrays of (001) oriented diamond nano-islands with diameters of < 500 nm and a height of ≈ 60 nm. In the islands, we identify single SiV color centers with narrow zero phonon lines down to 1 nm at room temperature.Color centers in diamond are being extensively investigated as stable, room temperature single photon emitters 1 simultaneously hosting highly controllable electronic spin systems. They are promising candidates for quantum information processing architectures (single photon sources and spin qubits) and as quantum sensors (e.g. for magnetic fields 2 and optical near fields 3 ). For all these applications, efficient collection of the fluorescence light emitted by color centers is crucial. The high refractive index of diamond (n = 2.4) here is an ambivalent property: on one hand, it renders light extraction from bulk material highly challenging due to total internal reflection; on the other hand, it enables controlling the emission properties of color centers using versatile diamond photonic structures like waveguides and nanocavities. 4 Recent work on color centers in diamond often uses top-down fabricated singlecrystal diamond nano/microstructures enabling efficient light collection. Top-down nanofabrication creates many photonic structures, e.g. nanopillars, in regular arrays in which color centers can be straightforwardly identified and (re-)addressed. 5 However, diamond nanofabrication requires sophisticated, non-standard procedures e.g. for plasma etching, that are challenging due to the chemical inertness of diamond. Avoiding diamond nanofabrication, 5 enhanced out-coupling of light is alternatively obtained using nanodiamonds (NDs) combined with non-diamond photonic structures. 4 However, color centers in NDs may suffer from unstable fluorescence and short spin coherence times. Random spatial placement and orientation of NDs, e.g. resulting from spin-coating deposition, renders identifying and re-addressing suitable color centers challenging. In this paper, we introduce an approach to unite the advantages of ND based systems and top-down fabrication of photonic structures i.e. controlled growth of regular arrays of heteroepitaxial diamond nano-and microstructures on iridium (Ir).In previous work, regular arrays of diamond nanostructures have been obtained by chemical vapor deposition (CVD) on diamond substrates through openings in a mask. 6-9 However, etching of the mask material in the CVD plasma led to the formation of high densities of color centers. 6,7 Thus, this method can so far not be considered as an approach capable of high purity diamond growth for single color center appl...