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2021
DOI: 10.1016/j.nanoen.2021.105802
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Strategies and implications of atomic layer deposition in photoelectrochemical water splitting: Recent advances and prospects

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Cited by 36 publications
(30 citation statements)
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“…Construction of core‐shell configuration to form the heterojunction and favorable band bending for charge carriers generation and transportation has been demonstrated as an effective strategy to overcome these shortcomings, where a shell coating can endow a photoelectrode with improved activity and stability. [ 28 ] At present, many kinds of core‐shell photoelectrodes with various composition and properties have been developed for PEC water splitting. In this section, we highlight the compositions of core‐shell photoelectrode.…”
Section: Core‐shell Tandem Nanostructured Photoelectrode For Pec Wate...mentioning
confidence: 99%
“…Construction of core‐shell configuration to form the heterojunction and favorable band bending for charge carriers generation and transportation has been demonstrated as an effective strategy to overcome these shortcomings, where a shell coating can endow a photoelectrode with improved activity and stability. [ 28 ] At present, many kinds of core‐shell photoelectrodes with various composition and properties have been developed for PEC water splitting. In this section, we highlight the compositions of core‐shell photoelectrode.…”
Section: Core‐shell Tandem Nanostructured Photoelectrode For Pec Wate...mentioning
confidence: 99%
“…ALDfabricated thin films are commonly used as protective coatings in numerous electrochemical applications. [8] The unique nanoshell fabricated using AER and ALD presented the advantages of the active material and passivation layer. The durability of NCS/NiS-10 in oxidizing and reducing environments after 10 days of continuous operation was outstanding, and the NCS/NiS-10 electrocatalyst outperformed many recently reported metal sulfide electrocatalysts (Table S1, Supporting Information).…”
Section: Overall Electrocatalytic Water-splitting Performance Of the ...mentioning
confidence: 99%
“…[7] ALD allows the deposition of one atom layer at a time, thereby facilitating thickness control at the atomic level. [8] The surfaces of ALD-fabricated layers are strain-free and smooth; therefore, their N A values are small. In this study, we used ALD to deposit NiO nanoshells on NiCo 2 O 4 (NC) cores.…”
Section: Introductionmentioning
confidence: 99%
“…The surface and interface engineering strategy in particular has the potential to improve the electrochemical features of electrode materials. Interface engineering can be carried out by coating a thin metal oxide layer over a core/shell architecture through atomic layer deposition (ALD). ALD is a unique process to achieve conformal coating of ultrathin layers and allow the control of atomic-scale thickness. , A recent study demonstrated that a Co 9 S 8 conformal layer over nickel foam led to excellent performance of a supercapacitor . Among metal oxides, nickel oxide (NiO) is typically used as the outer shell layer because it is a low-cost, readily available, and environmentally friendly material that exhibits excellent conductivity, high theoretical capacity, and mechanical stability. , Additionally, NiO facilitates fast redox reactions with a long cycling duration, which is considered to be important for achieving superior supercapacitive performance …”
Section: Introductionmentioning
confidence: 99%
“…ALD is a unique process to achieve conformal coating of ultrathin layers and allow the control of atomic-scale thickness. 28,29 A recent study demonstrated that a Co 9 S 8 conformal layer over nickel foam led to excellent performance of a supercapacitor. 30 Among metal oxides, nickel oxide (NiO) is typically used as the outer shell layer because it is a low-cost, readily available, and environmentally friendly material that exhibits excellent conductivity, high theoretical capacity, and mechanical stability.…”
Section: ■ Introductionmentioning
confidence: 99%