Hydrothermal-assisted CuS hierarchical architectures were grown in the presence of anionic sulfur sources, and the investigation of their degradation efficiency for a pesticide 4-chlorophenol (4-CP) under visible light irradiation was carried out. The dissociation of S 2– from the sulfur compound governs the nucleation of CuS followed by a specific pattern of growth to produce different morphologies. The self-assembled covellite spherical CuS flower architecture assembles in the presence of thiourea and exhibits the highest photodegradation activity. The open architecture of ∼2.3 μm spherical CuS flowers consisting of a ∼100 nm thick sheet encompasses a comparatively high surface area and particle growth along the (110) plane that facilitates more active sites for catalytic activity enhancement. The catalyst loading for 4-CP degradation has been optimized, and a detailed trapping mechanism has been explored.

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Monoclinic nanocuboid WO3 enhanced the photocatalyst efficiency of quasi nanobelt zinc oxide for dye degradation in the presence of visible light radiation.

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Atomic layer deposition (ALD) has found versatile applications in energy, environmental, and anthropogenic systems. The self‐terminating surface chemistry characteristic of ALD allows for atomic‐level control over film thickness and has unlocked attractive avenues for the development of novel nanostructured systems. Substantial modifications of standard ALD processes are achieved with the advent of powder coating technology using ALD. The basic principle of ALD is demonstrated along with a focus on the significant parameters governing the process in order to achieve good surface characteristics. The aim of this review is to explore the challenges faced in the development of reactors for powder coatings and solve the problems associated with particle distribution in the reactors. A theoretical briefing on the agglomeration phenomena in particles is provided for a better understanding of the typical particle sizes and their distributions in reactor systems. The gradual improvement in reactor designs, with particular emphasis on the homogeneous distribution of particles, is also discussed. Conclusively, the authors also review the emerging applications where this technology is being explored to overcome surface defects through the control of atomic growth on particles.