2017
DOI: 10.1088/1361-6641/aa9b53
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Strain-tuning of the optical properties of semiconductor nanomaterials by integration onto piezoelectric actuators

Abstract: The tailoring of the physical properties of semiconductor nanomaterials by strain has been gaining increasing attention over the last years for a wide range of applications such as electronics, optoelectronics and photonics. The ability to introduce deliberate strain fields with controlled magnitude and in a reversible manner is essential for fundamental studies of novel materials and may lead to the realization of advanced multi-functional devices. A prominent approach consists in the integration of active na… Show more

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Cited by 66 publications
(60 citation statements)
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References 139 publications
(366 reference statements)
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“…People have demonstrated tuning the energies of optical transitions in QDs and CQDs using temperature, DC electric field, AC electric field, and strain . Tuning via the Stark shift induced by a DC electric field is the most common method employed.…”
Section: Tunable Optical Propertiesmentioning
confidence: 99%
“…People have demonstrated tuning the energies of optical transitions in QDs and CQDs using temperature, DC electric field, AC electric field, and strain . Tuning via the Stark shift induced by a DC electric field is the most common method employed.…”
Section: Tunable Optical Propertiesmentioning
confidence: 99%
“…To the best of our knowledge this is the first demonstration of a strain-induced dipole rotation for a room-temperature SPE. [41,42] The reorientation of the dipole in response to strain is an unexpected and a surprising result.…”
Section: Figure 2 Large Red and Blue Strain-induced Shifts In A-b mentioning
confidence: 99%
“…One should understand the interfacial structure in detail by means of structural investigations performed in situ during pulsed-laser deposition (PLD). This approach reveals how the structural setup of the layer/substrate interface would affect the structure and the morphology of the deposited h-LuFeO 3 .Epitaxial strain is an extremely important issue in epitaxial thin film growth because the strain may change the properties of the epilayer, offering opportunities of material engineering; see the reviews in References [12,13], among others. For the Al 2 O 3 (0001) substrates, the lattice mismatch of the supercell is small but the huge misfit of the lattice constant suggests weak interfacial bonding [10].…”
mentioning
confidence: 99%
“…Epitaxial strain is an extremely important issue in epitaxial thin film growth because the strain may change the properties of the epilayer, offering opportunities of material engineering; see the reviews in References [12,13], among others. For the Al 2 O 3 (0001) substrates, the lattice mismatch of the supercell is small but the huge misfit of the lattice constant suggests weak interfacial bonding [10].…”
mentioning
confidence: 99%