1996
DOI: 10.1016/0022-0248(95)00872-1
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Strain relaxation in selectively grown ZnSe-epilayers on patterned GaAs-substrates

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Cited by 7 publications
(2 citation statements)
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“…There are several approaches by which one can achieve this, including the direct growth of 1D or 2D systems or the controlled etching of heterostructures. Some examples of direct growth techniques of III-V and II-VI 1D and 0D structures are the growth of microcrystallites [7,8], growth on patterned substrates [9,10], cleaved edge overgrowth [11,12], strain modulation by using sputtered stressors [13,14] and self-organized growth [15,16]. The controlled etching techniques are all based on a lithography process to create an etch pattern followed by an etching process.…”
Section: Introductionmentioning
confidence: 99%
“…There are several approaches by which one can achieve this, including the direct growth of 1D or 2D systems or the controlled etching of heterostructures. Some examples of direct growth techniques of III-V and II-VI 1D and 0D structures are the growth of microcrystallites [7,8], growth on patterned substrates [9,10], cleaved edge overgrowth [11,12], strain modulation by using sputtered stressors [13,14] and self-organized growth [15,16]. The controlled etching techniques are all based on a lithography process to create an etch pattern followed by an etching process.…”
Section: Introductionmentioning
confidence: 99%
“…For similar structures a complex strain situation was found, but no effect due to lateral confinement has been observed in the previous investigations. 8,9 The semiinsulating, ͑001͒ oriented GaAs substrates were patterned by holographic lithography using a Helium-Cd laser and wet chemical etching with a C 6 H 8 O 7 :H 2 O 2 ͑25:1͒ solution. This procedure yields gratings, consisting of trapezoidal shaped, 150 nm deep grooves along the ͓1 10͔ direction which are separated by 300 nm wide GaAs ridges.…”
mentioning
confidence: 99%