1998
DOI: 10.1063/1.120763
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Lateral confinement in ZnSe/ZnCdSe quantum wells grown on patterned substrates

Abstract: Articles you may be interested inDetermination of the indices of refraction of molecular-beam-epitaxy-grown ZnSe/ZnCdSe multiple-quantum-well structures J.Effect of ion induced damage on carrier lifetimes in strained CdZnSe/ZnSe quantum wells

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Cited by 6 publications
(1 citation statement)
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“…Several works on lithography with dry etching reported addressing the patterning of II-VI semiconductors and heterostructures such as ZnSe, CdZnSe/ZnSSe, ZnTe/CdTe, and ZnSe/GaAs with feature sizes of 30 nm without confinement effects in the emission spectra [119]. The well-selective, in situ compatible dry etching process for ZnSe comprises an ultrahigh vacuum (UHV) etching and subsequent epitaxial regrowth reported, whereases a strong selective etching with a selectivity up to 12:1 for ZnSe, ZnMgSSe structure was obtained [120].…”
Section: Dry Etchingmentioning
confidence: 99%
“…Several works on lithography with dry etching reported addressing the patterning of II-VI semiconductors and heterostructures such as ZnSe, CdZnSe/ZnSSe, ZnTe/CdTe, and ZnSe/GaAs with feature sizes of 30 nm without confinement effects in the emission spectra [119]. The well-selective, in situ compatible dry etching process for ZnSe comprises an ultrahigh vacuum (UHV) etching and subsequent epitaxial regrowth reported, whereases a strong selective etching with a selectivity up to 12:1 for ZnSe, ZnMgSSe structure was obtained [120].…”
Section: Dry Etchingmentioning
confidence: 99%