Strain effects on spinodal decomposition in TiO2–VO2films on TiO2(100) substrates

Fabrication of V1−x Ti x O2 microbolometers on Si3N4/SiO2 membranes

“…V-rich and Ti-rich regions, in the films could occur due to the slow cooling rate (−20 °C min −1 ) in the film preparation from T f to RT; a VTO solid solution in the TiO 2 -VO 2 system can only be obtained by rapidly quenching the sample from the firing or annealing temperature to RT. [29][30][31] Nevertheless, the film prepared at T f = 650 °C is referred to V 0.65 Ti 0.35 O 2 thin film from now on. The resistivity of the film is 12 Ωcm, much higher than other bolometer materials such as Ti and Bi.…”

Spinodal decomposition introduces strain-enhanced thermochromism in polycrystalline V1−xTixO2 thin films

“…Strain minimization is achieved by interfacing layers along the a(b)-axis, where the lattice mismatch is smaller. By applying post-growth annealing, (V,Ti)O 2 nanocomposites have been fabricated in bulk polycrystalline materials, 7,8 single crystals, 9 epitaxial films of various orientations grown on TiO 2 [10][11][12][13] and Al 2 O 3 substrates, [14][15][16] and, lately, polycrystalline films. 17 Furthermore, coherently strained SLs have been demonstrated by the enhancement of uphill diffusion during epitaxial growth on TiO 2 (001).…”