Abstract:A new inspection system for stencil mask using transmission electron beam (B-beam) has been developed to detect defects on masks for Electron Projection Lithography (EPL) and Low Energy E-beam Proximity projection Lithography (LEEPL) for 65 nm design rule and beyond [1]• For high-performance image acquisition, the combination of multi-line Time Delay integration (TDI) -CCD camera and electron optic system (EOS) have been achieved very wide field-of-view and accurate imaging in this system.In Image Processing U… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.