STEM semiconductor detector for testing SEM quality parameters

Reimer, Ludwig; Volbert, B.; Bracker, P.

doi:10.1002/sca.4950020205

Cited by 18 publications

(22 citation statements)

References 6 publications

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“…These experimental results are very similar to those of Vaughan (1976) and Reimer et al (1979). However, the measured values are probably influenced by uncertain factors which depend on specimen properties.…”

Section: Practical Examplessupporting

confidence: 91%

“…From these measured values, the incident electron current was estimated to be a linear function of the beam diameter square. These experimental results are very similar to those of Vaughan (1976) and Reimer et al (1979). However, the measured values are probably influenced by uncertain factors which depend on specimen properties.…”

Section: Practical Examplessupporting

confidence: 89%

“…The edge of crystals of indium was utilized to detect the blurring of an edge when using beam diameter down to several nanometers (Reimer et al, 1979).…”

Section: Introductionmentioning

confidence: 99%

“…To be uninfluenced by the effect of The electron beam diameter is convention-Received October 3, 1984;accepted December 12, 1984. contamination build-up, a heated tungsten wire was used (Vaughan, 1976). The edge of crystals of indium was utilized to detect the blurring of an edge when using beam diameter down to several nanometers (Reimer et al, 1979).…”

Section: Introductionmentioning

confidence: 99%

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Measurement of electron probe beam diameter by digital image processing

Oho¹,

Sasaki²,

Adachi³

et al. 1985

J. Elec. Microsc. Tech.

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The present report illustrates a computerized method for precise measurement of the diameter of an electron beam. The value of this measurement extends beyond simply providing an accurate estimate of resolution. Other salient areas which will benefit include quantitative X-ray microanalysis, energy loss spectroscopy, diffraction studies, and electron beam lithography. The biological sciences as well as the material sciences will gain enormously from improved accuracy in measurement (control) of beam diameter. It is anticipated that most or all of the mathematical manipulations outlined in this paper will be incorporated into digital electronic packages which will perform the functions automatically for setting the electron beam diameter to the scientist's choice. The purpose of the present report is to indicate some of the principles involved so that as electron microscopy becomes more computerized and automated, the user will have some understanding of what the electronics are doing rather than simply depressing a button or two and ignoring the power of what resides within the walls of the instrument.The performance of a scanning electron microscope (SEMI and a scanning transmission electron microscope (STEM) is roughly determined by the incident electron probe beam size (diameter) involving a sufficient electron current. In the present paper, the diameter of an ultrafine electron beam is measured indirectly from the information given by the blurring of an edge in a STEM or a SEM image of a crystalline specimen with fine, sharp edges. The obtained data were processed by digital image processing methods which give an accurate value of the beam diameter. For confirming the validity of this method, a suitable simulation based on the convolution theorem was performed. By using this measurement, we could measure the diameter of an ultrafine electron beam down to 2 nm, which could not be measured easily by previous techniques.

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Section: Practical Examplessupporting

confidence: 91%

Section: Practical Examplessupporting

confidence: 89%

“…The edge of crystals of indium was utilized to detect the blurring of an edge when using beam diameter down to several nanometers (Reimer et al, 1979).…”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Measurement of electron probe beam diameter by digital image processing

Oho¹,

Sasaki²,

Adachi³

et al. 1985

J. Elec. Microsc. Tech.

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show abstract

“…The first investigations of its application were made during the 1970s (Crawford & Liley, 1970;Woolf et al, 1972;Reimer et al, 1979;Grillon, 2006). The first investigations of its application were made during the 1970s (Crawford & Liley, 1970;Woolf et al, 1972;Reimer et al, 1979;Grillon, 2006).…”

Section: Introductionmentioning

confidence: 99%

Performance of High-Resolution SEM/EDX Systems Equipped with Transmission Mode (TSEM) for Imaging and Measurement of Size and Size Distribution of Spherical Nanoparticles

et al. 2014

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The analytical performance of high-resolution scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM/EDX) for accurate determination of the size, size distribution, qualitative elemental analysis of nanoparticles (NPs) was systematically investigated. It is demonstrated how powerful high-resolution SEM is by using both mono- and bi-modal distributions of SiO2 airborne NPs collected on appropriate substrates after their generation from colloidal suspension. The transmission mode of the SEM (TSEM) is systematically employed for NPs prepared on thin film substrates such as transmission electron microscopy grids. Measurements in the transmission mode were performed by using a "single-unit" TSEM transmission setup as manufactured and patented by Zeiss. This alternative to the "conventional" STEM detector consists of a special sample holder that is used in conjunction with the in-place Everhart-Thornley detector. In addition, the EDX capabilities for imaging NPs, highlighting the promising potential with respect to exploitation of the sensitivity of the new large area silicon drift detector energy dispersive X-ray spectrometers were also investigated. The work was carried out in the frame of a large prenormative VAMAS (Versailles Project on Advanced Materials and Standards) project, dedicated to finding appropriate methods and procedures for traceable characterization of NP size and size distribution.

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Automatic measurement of scanning beam diameter using an on‐line digital computer

Oho¹,

Kobayashi²,

Sasaki³

et al. 1986

J. Elec. Microsc. Tech.

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A method for the measurement of electron probe beam diameter by digital image processing has recently been published. The purpose of the present report is to describe the development of an automatic system for beam diameter measurement. To complete this system, a method based on a theory which combines automation and high-resolution conditions is proposed. In practice, the beam diameter is measured from the STEM image of a crystalline hole in a gold thin film, utilizing an on-line computer system equipped with newly developed digital processing programs linked to a SEM in the transmission mode. The functions of the programs include statistical processing, matching, noise removal, interpolation, selection, and rotation. By combining these functions, the scanning beam diameter is accurately measured, in spite of difficulties, under most electron microscope operating conditions. The user simply appoints the edge included in the STEM image.

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STEM semiconductor detector for testing SEM quality parameters

Cited by 18 publications

References 6 publications

Measurement of electron probe beam diameter by digital image processing

Measurement of electron probe beam diameter by digital image processing

Performance of High-Resolution SEM/EDX Systems Equipped with Transmission Mode (TSEM) for Imaging and Measurement of Size and Size Distribution of Spherical Nanoparticles

Automatic measurement of scanning beam diameter using an on‐line digital computer

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