Status of EUV reflectometry at PTB

Scholze, Frank; Laubis, Christian; Buchholz, Christian; Fischer, Andreas; Ploeger, Sven; Scholz, Frank; Wagner, H.M.; Ulm, G.

doi:10.1117/12.598728

Cited by 31 publications

(28 citation statements)

References 2 publications

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“…1 as La/N/B, and the multilayers where LaN was deposited using the reactive magnetron sputtering are indicated as La(N 2 )/B. The reflectance has been measured at the reflectometry beam line of the Physikalisch Technische Bundesanstalt (PTB, Berlin) at the BESSY II synchrotron radiation source using sigma-polarized soft X-ray radiation [4]. For the process optimization the wavelength of 6.75 nm was selected because it is sufficiently far from the B-K absorption edge at 6.6 nm.…”

Section: Resultsmentioning

confidence: 99%

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

et al. 2013

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In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N 2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.

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Section: Resultsmentioning

confidence: 99%

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

et al. 2013

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“…The beamlines used for reflectometry and some specifications are listed in Table 6. Relative standard uncertainties for spectral reflectance from 0.14% to 0.22% are achieved [68][69][70].…”

Section: Detector-based Radiometrymentioning

confidence: 99%

“…[67] with its degrees of freedom for the sample manipulator in red and for the detector in blue. The vacuum tank has a diameter of 2 m. Table 6 Compilation of PTB's beamlines and reflectometers used in the (V)UV [20,65,69,72], EUV [16,23,67,68,70,71], and X-ray spectral ranges [17,66]. The measured reflectance R of a sample is defined as:…”

Section: Detector-based Radiometrymentioning

confidence: 99%

A quarter‐century of metrology using synchrotron radiation by PTB in Berlin

Beckhoff¹,

Gottwald²,

Klein³

et al. 2009

Physica Status Solidi (b)

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For more than 25 years, the Physikalisch‐Technische Bundesanstalt has been strongly engaged in the field of metrology using synchrotron radiation. In Berlin, this research programme started together with the user operation of the electron storage ring BESSY I in the early 1980s. At the beginning, the work was focused on fundamental radiometry, i.e. using the storage ring as a primary radiation source standard and operating beamlines for source and detector calibration in the vacuum ultraviolet spectral range. Meanwhile, at the electron storage rings BESSY II and Metrology Light Source in Berlin‐Adlershof, the activities have been extended to a broad range of fundamental and applied photon metrology in the range from the far infrared to hard X‐rays, including methods like cryogenic radiometry, reflectometry and X‐ray fluorescence spectroscopy. In the present review, we give a short historical introduction to this work, describe our laboratories and the basic radiometric principles, and present examples of recent applications, largely performed within the framework of scientific cooperations with external partners from industry and research. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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“…One of the most promising methods is spectroscopic reflectometry in extreme ultraviolet (EUV) wavelength range [7]. Developed previously with synchrotrons as the radiation sources [8], the method is currently under development with laboratory plasma-based EUV sources [9,10] which should enable its widespread application [11]. In this contribution we are reporting the experimental realisation of a multi-angle spectroscopic reflectometer that is able to measure reflectivity in the wavelength region between 9 nm and 17 nm and with grazing illumination angles between 2° and 15°.…”

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confidence: 99%

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

Danylyuk

Herbert

Loosen

et al. 2015

Phys. Status Solidi C

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Modern nanotechnology is constantly raising demands to quality and purity of thin films and interlayer interfaces. As thicknesses of employed layers decrease to single nanometers, traditional characterization tools are no longer able to satisfy throughput, precision or non-destructibility requirements. Extreme ultraviolet (EUV) and soft X-ray reflectometry has not only demonstrated the ability to detect sub-nm thickness variations but also was shown to be very sensitive to chemical composition changes. Since the laboratory radiation sources in this wavelength range often emit in a relatively broad spectral range, a spectroscopic EUV reflectometry has been developed with the added benefit of a rapid measuring time on the order of milliseconds to seconds. In this paper, the extension of the method to multi-angle measurements will be presented. It allows to reduce a number of fit parameters in the analysis model, making the method suitable for complex samples of unknown composition. First experimental examples for Si-based layer systems measured under grazing incidence angles between 2° and 15° will be demonstrated and discussed

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Status of EUV reflectometry at PTB

Cited by 31 publications

References 2 publications

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

A quarter‐century of metrology using synchrotron radiation by PTB in Berlin

Multi‐angle spectroscopic extreme ultraviolet reflectometry for analysis of thin films and interfaces

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