Statistical Raman Microscopy and Atomic Force Microscopy on Heterogeneous Graphene Obtained after Reduction of Graphene Oxide

Abstract

2 graphene, graphene oxide, Raman spectroscopy, statistic Graphene oxide can be used as a precursor to graphene but the quality of graphene flakes is highly heterogeneous. Scanning-Raman-Microscopy (SRM) is used to characterize films of graphene derived from flakes of graphene oxide with an almost intact carbon framework (ai-GO). The defect density of these flakes is visualized in detail by analyzing the intensity and fullwidth at half-maximum of the most pronounced Raman peaks. In addition, we superimpose the SRM results with AFM images and correlate the spectroscopic results with the morphology. Furthermore, we use SRM technique to display the amount of defects in a film of graphene.Thus, an area of 250 x 250 µm 2 of graphene is probed with a step-size increment of 1 µm. We are able to visualize the position of graphene flakes, edges and the substrate. Finally, we alter parameters of measurement to analyze the quality of graphene fast and reliable. The described method can be used to probe and visualize the quality of graphene films.

High quality reduced graphene oxide flakes by fast kinetically controlled and clean indirect UV-induced radical reduction

“…Thus, it can be concluded that the quality of reduced oxo-G 1 is at least as high as the most potent chemical reduction method. 42,50,54 Characterization of the products by XPS XPS is a standard technique to determine the reduction degree of GO. High resolution C 1s spectra (see Fig S3 †) reveal a high efficiency of the reduction method.…”

Extending the environmental lifetime of unpackaged perovskite solar cells through interfacial design

“…S1 †). [41][42][43][44] Fig. 1b presents an AFM image of the oxo-G 1 lm deposited on a SiO 2 /Si substrate.…”

Scalable self-assembled reduced graphene oxide transistors on flexible substrate

“…Chemical reduction of GO with a mixture of hydroiodic acid (HI) and trifluoroacetic acid (TFA) yields graphene with an average defect density of 0.3% (as determined by scanning Raman microscopy). 17,19 The analysis of GO reveals flakes of graphene of mono-layer in average and the mean flake size is about 5 lm. 19 This type of functionalized graphene can be symbolized according to the recent systematic study as 5lm,0.3% 8% .…”

“…17,19 The analysis of GO reveals flakes of graphene of mono-layer in average and the mean flake size is about 5 lm. 19 This type of functionalized graphene can be symbolized according to the recent systematic study as 5lm,0.3% 8% . 20,21 For clearance, the abbreviation GO is used for this functionalized graphene throughout the manuscript.…”

“…The G-band intensity can be used to visualize the number of layer of rGO in the channel region. 19 The overall quality of rGO was checked before by the scanning Raman spectroscopic analysis of a rGO film on Si/SiO 2 substrate, and the average defect density of 0.3% is confirmed to be yielded by the reduction of GO with HI and TFA. On PEN substrate, Raman spectroscopy is partially hampered due to thermal instability of the substrate (laser power of 0.2 mW) and Raman signals of the PEN substrate as shown in Figure 2(b).…”