Proceedings of the 2007 International Workshop on System Level Interconnect Prediction 2007
DOI: 10.1145/1231956.1231966
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Statistical circuit optimization considering device andinterconnect process variations

Abstract: Process Variation has become a crucial challenge on both interconnect delay and reliability of nanometer integrated circuit designs. Furthermore, the dramatic increase of power consumption and integration density has led to high operating temperature. Temperature, as well as electromigration (EM) and power, also significantly affects the delay and reliability of interconnects. Considering process variation, we present the first work to use statistical methods to optimize the circuit area under timing, thermal … Show more

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Cited by 4 publications
(3 citation statements)
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“…5 shows the accuracy of our simplified POF o i . In general, the SOCP is known to have O(N 1.3 ) complexity [34], [35], where N is the number of variables and requires at most 30 iterations to solve even large problems [24]. Thus, it should be adequate to handle a VLSI track routing problem.…”
Section: A Motivation and Strategymentioning
confidence: 99%
See 1 more Smart Citation
“…5 shows the accuracy of our simplified POF o i . In general, the SOCP is known to have O(N 1.3 ) complexity [34], [35], where N is the number of variables and requires at most 30 iterations to solve even large problems [24]. Thus, it should be adequate to handle a VLSI track routing problem.…”
Section: A Motivation and Strategymentioning
confidence: 99%
“…Then, the formulation in Fig. 9 can be solved optimally and efficiently by the primal-dual interior-point method with O(N 1.3 ) bound, where N is the number of variables [34], [35]; thus, the solution will provide the optimal wire sizing and spacing for maximum yield. Fig.…”
Section: Globally Optimal Wire Sizing and Spacingmentioning
confidence: 99%
“…The shift to probabilistic design methodologies has produced a number of gate-level variation-aware optimization techniques [1] [2]. While progress at the gate-level is encouraging, the large productivity gains available in high-level synthesis (HLS) make it attractive and necessary to address the issue of process variations at a higher level of abstraction.…”
Section: Introductionmentioning
confidence: 99%