State-of-the-Art Reactive Pulsed Laser Deposition of Nitrides

Amorphous magnesium nitride films produced by reactive pulsed laser deposition

“…The material stoichiometry in films processed by RPLD is associated to the background gas pressure; the gas is able to react with the ablated species not only in the gas phase, but also at the target and substrate surfaces [9]. Consequently the film composition can be customized by controlling the deposition pressure, being feasible to grow materials in metastable states by RPLD.…”

Detailed studies of aluminum thin films morphology deposited by pulsed laser ablation

“…Our PLAD experiments were carried out in high vacuum stainless-steel system (reported elsewhere) pumped to a base pressure of 10 −5 Pa by a turbomolecular pump [11]. The used laser source was an UV XeCl excimer laser (Lambda-Physik, LPX 315i, = 308 nm, = 30 ns, repetition rate of 10 Hz).…”

Pulsed Laser Deposition (PLD)

“…The ablation mechanism of Group III nitrides by PLD differs between nitride and metal targets [79]. Polycrystalline GaN and AlN targets exhibiting higher purity and lower surface area than their ceramic counterparts have recently become available.…”