“…SnO 2 in rutile structure, a wide band gap n‐type semiconductor, has been widely used in semiconductor gas sensors , thin‐film transistors , solar cells , oxidation catalysts for CO , and CH 4 , transparent electrode for flat panel displays , and lithium ion batteries owing to low electrical resistivity, high transmission in the visible region, good electrochemical properties and high chemical stability. The fabrication of SnO 2 thin films, especially high quality epitaxial films, has been studied by various deposition techniques including oxygen plasma‐assisted molecular beam epitaxy , physical vapor deposition , pulsed laser deposition , spray pyrolysis , sputtering , atomic layer deposition (ALD) , and chemical vapor deposition (CVD) . CVD is an advantageous deposition method particularly suited for the synthesis of high purity crystals with excellent crystalline and optical properties .…”