Standing-wave Effect in Photoresist with and without HMDS

Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility

“…Therefore, this study evaluates the effect of adding a water-soluble organic solvent in an alkali developer, particularly glycerol. The lithography performance of a novolak-type positive-tone resist in developer TMAH aqueous solution with or without glycerol is observed and compared based on a sensitivity curve and exposure dose vs. solubility curve [13][14][15][16]. Furthermore, we compared the resolution of the novolak resist with the developed TMAH aqueous solution with or without glycerol by the lithography simulation system (PROLITH) and direct observation of the resist pattern profile using scanning electron microscopy (SEM) images [17][18][19][20].…”

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

“…Previously, we investigated the effects on lithography characteristics of differences in the properties of novolac resists [1][2][3][4]. These properties included average molecular weight, amount of photoactive compound (PAC) added, and the esterification ratio of the PAC.…”

Study of the lithography characteristics of novolak resist at different PAC concentrations

“…Previously, we examined the effects on lithography characteristics of differing molecular weight distributions and HMDS effects in novolak resists [1][2]. For the experiments described in this current report, we prepared five types of novolak resists, with varying photoactive compound (PAC) concentrations, and measured and compared their development characteristics [3].…”