In a recent study, we measured the exposure and development characteristics of five types of novolak resists with varying photoactive compound (PAC) concentrations. This report presents measurement results, as well as results of comparisons of patterns and process margins, obtained using the PROLITH lithography simulator. We also used PROLITH to investigate the effects of PAC concentrations on the swing ratio. Both experiment and simulation confirm that increasing PAC loading results in improved exposure latitude and reduced feature size swing ratio.
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