2015
DOI: 10.4028/www.scientific.net/ssp.242.67
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Stable, Extrinsic, Field Effect Passivation for Back Contact Silicon Solar Cells

Abstract: A new technique is described by which ionic species can be rapidly transported into oxide films, and once there provide effective and stable field effect passivation to silicon surfaces. Field effect passivation in thermally grown oxide films has been achieved by embedding potassium ions using a combined drift and diffusion mechanism at high temperature. This process has been shown to be over 10 times faster than a pure diffusion process. The resulting passivation stable for periods exceeding 600 days, with li… Show more

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Cited by 15 publications
(14 citation statements)
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References 13 publications
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“…Additional work by the same authors has provided evidence of stable and controlled FEP. 61 Figure 7 also shows the difference in passivation provided by positive versus negative charges. This asymmetry is a characteristic feature of the interfacial physical properties and had been first pointed out by Girisch 15 when setting the surface SRH model.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Additional work by the same authors has provided evidence of stable and controlled FEP. 61 Figure 7 also shows the difference in passivation provided by positive versus negative charges. This asymmetry is a characteristic feature of the interfacial physical properties and had been first pointed out by Girisch 15 when setting the surface SRH model.…”
Section: Discussionmentioning
confidence: 99%
“…61 Previous research has mainly focused on the effect of the surface charge on the effective lifetime of silicon for one excess minority carrier concentration or one surface charge density. [62][63][64] Here, the dependence of surface recombination velocity on both independent variables is explored.…”
Section: Application To Oxide Passivated N-type C-simentioning
confidence: 99%
“…Despite this, some of the most electrically inactive surfaces have been obtained using such techniques. Bonilla et al have used corona discharge or alkali ionic species to extrinsically charge oxide films and improve their FEP properties. They also performed forming gas anneals to extrinsically incorporate H to the interface and combine it with extrinsic corona FEP .…”
Section: Materials and Methods For Silicon Surface Passivationmentioning
confidence: 99%
“…High frequency capacitance-voltage (CV) was performed in an Agilent E4980AL Precision LCR Meter. Kelvin probe (KP) measurements were carried out using a modified Scanning Kelvin Probe from KP Technology as described in [28].…”
Section: Characterisationmentioning
confidence: 99%