Abstract:The scope of this investigation was to increase the throughput of high current implantation and study the impact on the supporting tool set, photostabilization and photoresist strip. In this paper, the effects of various pre-treatments on stripping of photoresist after high current implants are reported. The surface of positive photoresist can be carbonized (hardened) by the ion implantation process and cause residues and particles during ashing. In the case of high current implants typically used for source a… Show more
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