2022
DOI: 10.1016/j.nimb.2022.01.001
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Sputtering yield and nanopattern formation study of BNSiO2 (Borosil) at elevated temperature relevance to Hall Effect Thruster

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Cited by 3 publications
(5 citation statements)
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“…The gap between the experimental measurements and the numerical estimations by using "enlarged" Ranjan et al's [13] data was attributed to neglecting the effect of wall temperature. By introducing the temperature coefficient C T (Section 2.2), the sputter yield value, and hence the erosion, indeed increases, as demonstrated by Parida et al [12].…”
Section: Resultsmentioning
confidence: 77%
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“…The gap between the experimental measurements and the numerical estimations by using "enlarged" Ranjan et al's [13] data was attributed to neglecting the effect of wall temperature. By introducing the temperature coefficient C T (Section 2.2), the sputter yield value, and hence the erosion, indeed increases, as demonstrated by Parida et al [12].…”
Section: Resultsmentioning
confidence: 77%
“…The results were obtained with C T = 5.5, which meant considering five times the value of the sputtering yield measured at room temperature (300 K) at each energy and angle. Parida et al [12] experimentally measured that the sputtering yield at 55°and 500 eV (which is higher than the typical value estimated in HETs' channel, i.e., lower than 250 eV) is twice the value at room temperature.…”
Section: Discussionmentioning
confidence: 81%
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“…In the densification phase, the anisotropic growth is negligible [55], and the metals cannot be deformed before the structural transformation of the dielectric has been completed, i.e., when the sample overlaps completely. The thermal spike nature has been proposed to interpret different crystallographic orientations of materials; see for example reference [56]. Ion irradiation of amorphous SiO 2 in various energy ranges (between 1 MeV and 1 GeV) causes structural changes [43].…”
Section: Resultsmentioning
confidence: 99%