No abstract

No abstract

No abstract

Fabrication of highly dense conical nanostructures and their subsequent controlled metallization make them ideal candidates for enhancing cold cathode electron emission efficiency. For instance, hierarchical growth of self-assembled noble metal...

No abstract

No abstract

No abstract

Production of superhydrophobic polytetrafluoroethylene (PTFE) by Ar plasma etching is challenging as it leads to defluorination, resulting in a hydrophilic surface. The effect of radiofrequency power, treatment time, impurity, and surface temperature on Ar plasma‐treated PTFE was investigated for producing a large‐area superhydrophobic PTFE surface. To avoid impurity and substrate temperature effects, a single electrode‐based arrangement with a sacrificial PTFE disc behind the specimen was used for plasma discharge. After 5 min treatment at 100 W, the surface became superhydrophobic (water contact angle = 156°) due to the formation of isotropic nanostructures. However, 30 min of plasma treatment caused severe chemical changes resulting in a hydrophilic surface (water contact angle = 14°). A yellowish layer was formed on the surface due to crosslinking, redeposition of fluorocarbon species, and iron impurities from the plasma system confirmed by X‐ray photoelectron spectroscopy analysis.