Sputtering Studies of Multi-Component Materials by Weight Loss and Cavity Ring-Down Spectroscopy

Yalin, Azer P.; Surla, V.; Farnell, Casey C.; Butweiller, Mark; Williams, John D.

doi:10.2514/6.2006-4338

Cited by 17 publications

(31 citation statements)

References 13 publications

(20 reference statements)

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“…The weight loss system has been previously described 8 . Here, we summarize the system and provide updates on system improvements.…”

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

“…The BN samples used were typically 1-inch squares. Details of sample holders and alignment were previously reported 8 . For measurement at different incidence angles the sample holders are angled at 0˚, 30˚, 45˚, 60˚, and 75˚.…”

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

“…The 1000-liter SPECTOR chamber uses a CTI-400 cryogenic pump, and is equipped with a 16-cm diameter ion source. To ensure an accurate assessment of the sputtering behavior, a thorough characterization of the ion beam current density profile was conducted 8 . Knowledge of the incident current is needed in the sputter yield computation.…”

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

“…In these devices, sputter erosion of grids and other components places a fundamental limitation on lifetimes. Additionally, sputtered particles from within the * 8 , collector plates [9][10] , mass spectrometry 11 , quartz crystal microbalance [2][3][4][5][6][12][13][14] , Rutherford backscattering [15][16] , radioactive tracers 17 , and cavity ring-down spectroscopy 18 . In this contribution we present sputter measurements of BN obtained by both weight loss and the quartz crystal microbalance (QCM).…”

Section: Introductionmentioning

confidence: 99%

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Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance and Weight Loss (Preprint)

Rubin¹,

Topper²,

Yalin³

2007

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Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing this collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden to Department of Defense, Washington Headquarters Services, Directorate for Information Operations and Reports (0704-0188), 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302. Respondents should be aware that notwithstanding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS. REPORT DATE (DD-MM-YYYY) SPONSORING / MONITORING AGENCY NAME(S) AND ADDRESS(ES) 10. SPONSOR/MONITOR'S ACRONYM(S)Air Force Research Laboratory (AFMC) AFRL/PRS SPONSOR/MONITOR'S Pollux Drive NUMBER(S)Edwards AFB CA 93524-7048 AFRL-PR-ED-TP-2007-406 DISTRIBUTION / AVAILABILITY STATEMENTApproved for public release; distribution unlimited (PA #07939A). ABSTRACTWe present results of differential sputter yield measurements of HBC and HBR grades of boron nitride due to bombardment by xenon ions. Total sputter yield measurements are made using a weight loss approach. Differential sputter yield measurements (of condensable components) are made using a quartz crystal microbalance (QCM). The QCM measurement allows full angular resolution, i.e. differential sputtering yield measurements are measured as a function of both polar angle and azimuthal angle. Measured profiles are presented for 100, 250, 350 and 500 eV Xe+ bombardment at 0º, 15º, 30º and 45º angles of incidence. We fit the measured profiles with Modified Zhang expressions using two free parameters: the total sputter yield, Y, and characteristic energy E*. Sputtering of HBC versus HBR grades of BN is compared, as is results of sputter measurements from the weight loss versus QCM approaches. Finally, effects of sample moisture absorption are considered. Abstract: We present results of differential sputter yield measurements of HBC and HBR grades of boron nitride due to bombardment by xenon ions. Total sputter yield measurements are made using a weight loss approach. Differential sputter yield measurements (of condensable components) are made using a quartz crystal microbalance (QCM). The QCM measurement allows full angular resolution, i.e. differential sputtering yield measurements are measured as a function of both polar angle and azimuthal angle. Measured profiles are presented for 100, 250, 350 and 500 eV Xe+ bombardment at 0º, 15º, 30º and 45º angles of incidence. We fit the measured profiles with Modified Zhang expressions using two free parameters: the total sputter yield, Y, and characteristic energy E*. Sputtering of HBC versus HBR grades of BN is compared, a...

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“…The weight loss system has been previously described 8 . Here, we summarize the system and provide updates on system improvements.…”

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

Section: B Weight Loss Measurement Systemmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance and Weight Loss (Preprint)

Rubin¹,

Topper²,

Yalin³

2007

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show abstract

“…Techniques such as weight loss 10) , collector plate 11) , quartz crystal microbalance 12,13) , radioactive tracers 14) , mass spectrometry 15) , and Rutherford backscattering 16) each have certain advantages and can be appropriate for material sputter characterization studies but none readily meets all of the above criteria. The need for a sensitive nonintrusive measurement suggests the use of optical techniques.…”

Section: Introductionmentioning

confidence: 99%

Development of Real-time Erosion Monitoring System for Hall Thrusters by Cavity Ring-Down Spectroscopy

Yamamoto

Tao

Yalin

2010

AEROSPACE TECHNOLOGY JAPAN

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Sputter monitoring system using continuous-wave cavity ring-down spectroscopy (cw-CRDS) was built for both lifetime assessment and contamination effects in Hall thrusters. We have performed measurements of sputtered manganese atoms from acceleration channel wall (stainless steel 316) in an anode layer type Hall thruster. The measurement strategy is based upon detection of manganese atoms via an absorption line from ground state at a wavelength of 403.076 nm. The path-integrated number density is 1.4 0.

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Modeling low energy sputtering of hexagonal boron nitride by xenon ions

Yim¹,

Falk

Boyd

2008

Journal of Applied Physics

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The sputtering of hexagonal boron nitride due to low energy xenon ion bombardments occurs in various applications including fabrication of cubic boron nitride and erosion of Hall thruster channel walls. At low ion energies, accurate experimental characterization of sputter yields increases in difficulty due to the low yields involved. A molecular dynamics model is employed to simulate the sputtering process and to calculate sputter yields for ion energies ranging from 10 eV to 350 eV. The results are compared to experimental data and a semi-empirical expression developed by Bohdansky is found to adequately describe the simulation data. Surface temperature effects are also investigated, and the sputter yield at 850 K is approximately twice that at 423 K.Comment: 19 pages, 8 figure

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Sputtering Studies of Multi-Component Materials by Weight Loss and Cavity Ring-Down Spectroscopy

Cited by 17 publications

References 13 publications

Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance and Weight Loss (Preprint)

Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance and Weight Loss (Preprint)

Development of Real-time Erosion Monitoring System for Hall Thrusters by Cavity Ring-Down Spectroscopy

Modeling low energy sputtering of hexagonal boron nitride by xenon ions

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