1990
DOI: 10.1016/0168-583x(90)90178-w
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Sputtering and surface topography of oxides

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Cited by 34 publications
(18 citation statements)
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“…1a, top). It is well known that when reasonably massive ions with energies of several keV impinge on a surface, an atomic scale erosion process, called sputtering, removes on the order of one atom from the surface for every incident ion [15][16][17][18] . We reasoned that as material was removed from the flat surface by this process, it would ultimately intercept the bottom of the bowl shaped cavity, forming a nanopore, as shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…1a, top). It is well known that when reasonably massive ions with energies of several keV impinge on a surface, an atomic scale erosion process, called sputtering, removes on the order of one atom from the surface for every incident ion [15][16][17][18] . We reasoned that as material was removed from the flat surface by this process, it would ultimately intercept the bottom of the bowl shaped cavity, forming a nanopore, as shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…(1) Bohdansky (1978); (2) Roth et al (1976); (3) Roth et al (1979); (4) Rosenberg & Wehner (1962); (5) Hechtl et al (1981); (6) Bach (1970); (7) Nenadović et al (1990); (8) Tielens et al (1994); (9) Behrisch et al (1976).…”
Section: Non-thermal Sputteringunclassified
“…Kiloelectronvolt ion beams induce atomic scale rearrangements when they are incident on a material surface by processes that include sputter erosion, atomic displacement, ion implantation, surface diffusion, and viscous flow [1][2][3][4][5][6][7][8][9][10][11]. The controllable, nanometer-scale nature of these changes make ion beams an interesting candidate for use as a nanofabrication tool.…”
mentioning
confidence: 99%