It
has been challenging to grow a readily-detachable crystalline
film on a crystalline substrate. This is because (1) strong chemical
bondings between the film material and the underlying substrate are
typically a prerequisite for a crystalline film to be grown, and (2)
it cannot be easily carried out to break down the chemical bondings
over the entire or a large fraction of the interfacial region unless
the substrate is readily wet-etchable. Alternatively, remote epitaxy
was previously proposed to accomplish this task, but it requires an
ultra-small thickness and state-of-the-art transfer of a 2D space
layer. This challenging task can, however, be accomplished less stringently
if the interfacial area, in which the grown material directly makes
chemical bondings with the substrate, is made sufficiently small by
covering the substrate with 2D materials with an inherent small opening.
Here, we show that readily-detachable GaN and ZnO crystalline domains
can be grown, respectively, on graphene/sapphire and MoS2/GaN/sapphire templates by carrying out thru-hole epitaxy, which
is lateral growth over 2D materials with inherent small openings.
We also demonstrate that the mechanism of the thru-hole epitaxy can
be adopted for the fabrication of an array of transferrable microstructures
over multilayer 2D materials. Moreover, our results suggest that thru-hole
epitaxy is compatible with the bottom-up fabrication of an array of
readily transferable inorganic microstructures, which can become basic
building blocks for inorganic-material-based flexible devices.