Spin Transport in Self Assembled All-Metal Nanowire Spin Valves: A Study of the Pure Elliott-Yafet Mechanism

Pramanik, Sandipan; Stefanita, Carmen-Gabriela; Bandyopadhyay, Supriyo

doi:10.1166/jnn.2006.360

Cited by 6 publications

(1 citation statement)

References 13 publications

(21 reference statements)

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“…Application can be found in areas like nanowire transistors (Chen et al 2004) and magnetoelectrical devices. In the latter case magnetic materials with periodically modulated layers at the nanometer scale have been explored (Kruglyak et al 2005;Pramanik et al 2006). The discovery of giant magnetoresistance (GMR) effect in Fe/Cr multilayers (Baibich et al 1988) has attracted extensive interest.…”

Section: Introductionmentioning

confidence: 99%

Proton beam writing: a platform technology for nanowire production

et al. 2008

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P-beam writing (proton beam writing) is a unique direct write 3D nano-lithographic technique which has been developed at the Centre for Ion Beam Applications (CIBA), in the Physics Department of the National University of Singapore. This technique employs a focused MeV proton beam which is scanned in a predetermined pattern over a resist (e.g. PMMA, SU-8 or HSQ), which is subsequently chemically developed. In e-beam writing as well as p-beam writing the energy loss of the primary beam is dominated by energy transfer to substrate electrons. Unlike the high energy secondary electrons generated during e-beam writing the secondary electrons induced by the primary proton beam have low energies (typically less than 100 eV) and therefore a limited range, resulting in minimal proximity effects. The low proximity effects exhibited by p-beam writing coupled with the straight trajectory and high penetration of the proton beam enables the production of high aspect ratio, high density 3D microand nano-structures with well defined smooth side walls to be directly written into resist materials. These structures can be used as templates to electroplate metallic nanowires.

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