2020
DOI: 10.3390/coatings10111029
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Spin Coating Immobilisation of C-N-TiO2 Co-Doped Nano Catalyst on Glass and Application for Photocatalysis or as Electron Transporting Layer for Perovskite Solar Cells

Abstract: Producing active thin films coated on supports resolves many issues of powder-based photo catalysis and energy harvesting. In this study, thin films of C-N-TiO2 were prepared by dynamic spin coating of C-N-TiO2 sol-gel on glass support. The effect of spin speed and sol gel precursor to solvent volume ratio on the film thickness was investigated. The C-N-TiO2-coated glass was annealed at 350 °C at a ramping rate of 10 °C/min with a holding time of 2 hours under a continuous flow of dry N2. The C-N-TiO2 films we… Show more

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Cited by 12 publications
(3 citation statements)
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References 79 publications
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“…The input power of the incident light is denoted by P in . The FF is determined in the following manner [ 61 ]: …”
Section: Resultsmentioning
confidence: 99%
“…The input power of the incident light is denoted by P in . The FF is determined in the following manner [ 61 ]: …”
Section: Resultsmentioning
confidence: 99%
“…Spin coating technology is an advanced, cheap, easy-to-control uniform coating deposition technology that can be used to deposit NPs onto different substrate surfaces [82,83]. A typical spin-coating process is present in Figure 6, and the process can be divided into three stages after preparing the material and substrate.…”
Section: Spin Coatingmentioning
confidence: 99%
“…Before deposition, small pieces (2 cm 2 ) of corning glass substrates were cleaned in acetone and isopropanol in an ultrasonic bath for 10 min each and then rinsed repeatedly with warm deionized water. A three-zone chemical vapor deposition (CVD) system with a horizontal ceramic tube (Zhengzhou Brother XD-1600MT Furnace Co., LTD, Zhengzhou, China; tube has 6 cm inner diameter and each zone is 20 cm in length [22]) was used to deposit the lead halides [20,21]. The outlet side of the ceramic tube is connected to a rotary vacuum pump, which achieves a base pressure of 0.05 mbar.…”
Section: Lead Halide Film Depositionmentioning
confidence: 99%