Spectroscopic study on pulsed laser ablation of graphite target in ECR nitrogen plasma for carbon nitride film deposition

Spectroscopic Characterization of Plasmas Generated by ECR Microwave Discharge of N2 Gas and Pulsed Laser Ablation of a B4C Target

“…Beyond 5 mm from the target, they can hardly be recognized. When a graphite target was ablated in the ECR nitrogen plasma instead of the B 4 C target, in contrast, the C 2 Swan emissions were observed in a much larger region 20…”

“…The experimental apparatus used for plasma generation and film deposition is nearly identical to that used in ref. 19, for which an additional system for OES measurements was arranged 20. High purity (>99.999%) N 2 gas was fed into the ECR discharge chamber at a working pressure of 4 × 10 −2 Pa, where ECR nitrogen plasma was generated by ECR discharge using 2.45 GHz microwave.…”

“…The system and method used for OES measurements are similar with that described in ref. 20. The plasmas were imaged onto the entrance slit of a 0.5 m spectrometer (Acton Research, Spectra Pro 500i) by a light collecting lens and an UV–Vis optical fiber bundle (Acton Research, ILG‐455‐020‐1).…”

“…OES is also convenient in detecting species in the plasma with high time and space resolution. We have previously investigated ECR‐plasma assisted RPLD process for the deposition of carbon nitride films using the OES method by examining the temporal evolution and spatial distribution of the optical emissions during film deposition 20…”

Formation of diatomic molecular radicals in reactive nitrogen-carbon plasma generated by electron cyclotron resonance discharge and pulsed laser ablation

“…8,9 If the target ablation is performed in the plasma generated by ECR discharge, the interactions between the plume induced by PLA and the surrounding plasma generated by ECR discharge result in the formation of a hybrid plasma containing the species originally present in the working gas and directly ablated from the target, as well as, the species formed as the products of gas-phase reactions occurring in the resulting plasma. 10,11 This is an unusual plasma with unique characteristics very different from those of the plasma solely generated by ECR discharge or induced by PLA, exhibiting high excitation and high reactivity of plasma species including reactive radials and ions. Such a plasma offers several merits in plasma processing for materials synthesis and fabrication.…”