Interfaces are ubiquitous in semiconductor low-dimensional
systems
used in electronics, photonics, and quantum computing. Understanding
their atomic-level properties has thus been crucial to controlling
the basic behavior of heterostructures and optimizing the device performance.
Herein, we demonstrate that subnanometer interfacial broadening in
heterostructures induces localized energy states. This phenomenon
is predicted within a theory incorporating atomic-level interfacial
details obtained by atom probe tomography. The experimental validation
is achieved using heteroepitaxial (Si1–x
Ge
x
)
m
/(Si)
m
superlattices as a model system
demonstrating the existence of additional paths for hole–electron
recombination. These predicted interfacial electronic transitions
and the associated absorptive effects are evaluated at variable superlattice
thickness and periodicity. By mapping the energy of the critical points,
the optical transitions are identified between 2 and 2.5 eV,
thus extending the optical absorption to lower energies. This phenomenon
is shown to provide an optical fingerprint for a straightforward and
nondestructive probe of the subnanometer broadening in heterostructures.