Spectroscopic characterization of electron-beam evaporated V2O5 thin films

Ramana, C. V.; Hussain, O. M.; Naidu, B. S.; Reddy, P. Jayarama

doi:10.1016/s0040-6090(97)00141-7

Cited by 171 publications

(90 citation statements)

References 33 publications

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“…2(b)) exhibit only a wide maximum between 1200 and 1500 cm À1 , where no Raman-active modes for VO 2 are present; peaks associated with VO 2 and V 2 O 5 are in fact reported only at wave numbers below 1000 cm À3 . [20][21][22] This suggests the formation of a highly defected structure, consistent with the weak XRD reflections.…”

supporting

confidence: 63%

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Tsui

Hildebrand

et al. 2013

Appl. Phys. Lett.

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supporting

confidence: 63%

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Tsui

Hildebrand

et al. 2013

Appl. Phys. Lett.

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“…3(b) suggests that the oxide structure changes with thickness. An increase in FWHM has been attributed to a substoichiometry of the oxide of approximately 10% for the oxidation of Vanadium, [17] or to a transition from crystalline to amorphous material for oxidized Molybdenum. [18] However, in either case, the increase in FWHM is not as pronounced as observed for Ru.…”

Section: Resultsmentioning

confidence: 99%

Unraveling the oxidation of Ru using XPS

Ernst

Sloof

2008

Surface & Interface Analysis

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A method is presented to analyze XPS spectra recorded from thin (<5 nm) oxide layers with known thickness on corresponding metal substrates. With this method, the contribution of the oxide overlayer can be separated from the metal substrate for the metal core level line, even when the difference in binding energy between metallic and oxidic electrons is small. This method involves the fitting of Doniach-Sunjic (DS) line shapes for the metallic and oxidic state to the measured spectrum, where the area ratio between the metallic and oxidic contribution is fixed through the known thickness.The method was applied to ruthenium single crystals with a (0001) surface that were oxidized in a ultra-high vacuum (UHV) chamber at a temperature of 673 K and an oxygen pressure between 1×10 −4 and 1×10 −2 Pa. Analysis of the oxidic contribution to the Ru 3p 3/2 line shows that two different types of oxides can be formed in the oxidation process.

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“…1, which is quite useful to understand the spectroscopic/structural data. Several techniques have been used to prepare the V 2 O 5 films, namely thermal evaporation, 11 sputtering, 12 e-beam deposition, 13 sol-gel 14 and pulsed laser deposition (PLD). 15 The device performances and particular applications of the resulting films depend on the technique used to grow the V 2 O 5 films and the deposition process parameters.…”

Section: Introductionmentioning

confidence: 99%

Surface analysis of pulsed laser‐deposited V₂O₅ thin films and their lithium intercalated products studied by Raman spectroscopy

Ramana

Smith

Hussain

et al. 2005

Surface & Interface Analysis

103

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Vanadium pentoxide films were prepared by pulsed laser deposition (PLD) and their surface structure evolution in relation to the growth temperature and as a function of lithium intercalation was studied. The deposition was made onto various substrate materials over a wide substrate temperature range of 30-500• C, keeping the oxygen partial pressure at 100 mTorr. The surface properties of V 2 O 5 films were studied by Raman scattering spectroscopy in order to understand the effect of substrate temperature on the structure and growth behavior. The results indicated that the structure of PLD V 2 O 5 films is highly dependent on the growth temperature. The Raman spectra provide additional insight into the nature of the structural changes of lithiated films, showing the appearance of the d-and g-phases of Li x V 2 O 5 .

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Spectroscopic characterization of electron-beam evaporated V2O5 thin films

Cited by 171 publications

References 33 publications

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Unraveling the oxidation of Ru using XPS

Surface analysis of pulsed laser‐deposited V₂O₅ thin films and their lithium intercalated products studied by Raman spectroscopy

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Spectroscopic characterization of electron-beam evaporated V2O5 thin films

Cited by 171 publications

References 33 publications

Metal-insulator transition in nanocomposite VOx films formed by anodic electrodeposition

Metal-insulator transition in nanocomposite VOx films formed by anodic electrodeposition

Unraveling the oxidation of Ru using XPS

Surface analysis of pulsed laser‐deposited V2O5 thin films and their lithium intercalated products studied by Raman spectroscopy

Contact Info

Product

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About

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Metal-insulator transition in nanocomposite VO_x films formed by anodic electrodeposition

Surface analysis of pulsed laser‐deposited V₂O₅ thin films and their lithium intercalated products studied by Raman spectroscopy