Spectral and kinetic analysis of heterogeneous gas discharge plasma in the flow of an Al, H2O, and Ar mixture

Bityurin, V. A.; Grigоrenko, A. V.; Efimov, A. V.; Klimov, A. I.; Korshunov, O. V.; Kutuzov, D. S.; Chinnov, V. F.

doi:10.1134/s0018151x14010052

Cited by 14 publications

(3 citation statements)

References 7 publications

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“…The results of a study of the characteristics and kinetics of processes in a heterogeneous plasma based on mixed flows of a buffer gas -argon, an oxidizing agent (water molecules), and aluminum dustare presented by Bityurin et al [1,2]. We studied the plasma of glow and pulsed discharges, as well as a combined high-frequency discharge in mixtures of argon, water vapor, and aluminum dust.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of aluminum oxide nanoparticles in overstressed nanosecond discharge plasma with the ectonic sputtering mechanism of aluminum electrodes

Шуаибов

Minya

Малинина

et al. 2020

Highlights in BioScience

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The results of studying the conditions of synthesis and luminescence of aluminum oxide nanoparticles in a plasma of an overstressed nanosecond discharge ignited between aluminum electrodes at an interelectrode distance of 2 mm and air pressure in the range of 50-202 kPa are presented. It was shown that the plasma of the investigated discharge is characterized by a wide luminescence band in the spectral range of 300–430 nm, which is associated with the formation of F and F + centers. The research results can be used in micro-nanotechnology, biomedical engineering to obtain nanostructured alumina substrates, on which other nanodevices and films from biomaterials can be placed. The aim of the work was to establish the possibility of detecting small nanoparticles - aluminum oxide nuclei by emission spectroscopy methods and the synthesis of nanostructured alumina films under atmospheric conditions (without the use of vacuum technology) over a large area.

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Section: Introductionmentioning

confidence: 99%

Synthesis of aluminum oxide nanoparticles in overstressed nanosecond discharge plasma with the ectonic sputtering mechanism of aluminum electrodes

Шуаибов

Minya

Малинина

et al. 2020

Highlights in BioScience

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“…Argon as a buffer and an exciplex forming gas is widely used in gas discharge molecular UV-VUV laser and different plasma chemical reactors on the basis of water vapors and metals [10], and also in reac tors on the basis of halogen containing gases [11].…”

Section: Introductionmentioning

confidence: 99%

Characteristics and parameters of plasma of a gas-discharge UV–VUV lamp on a system of bands of argon chloride and chlorine molecules

et al. 2015

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The results of experimental study of the characteristics of a two wave UV-VUV lamp on a mixture of argon and freon vapors (CCl 4 ) with pumping by a nanosecond barrier discharge are presented. The spectral characteristics of the radiator in the wavelength range of 160-300 nm and the current and voltage oscillo grams have been studied. The intensity of the radiation of the 175 nm ArCl (B → X) and 258 nm Cl 2 (D' → A') bands were optimized during the variation of pressure and partial composition of the working mixture Ar-CCl 4 , and also the conditions of the ignition of the nanosecond discharge with two dielectric barriers. The main processes of the formation of the argon chloride molecule have been considered in the barrier discharge on the basis of the Ar-CCl 4 mixture.

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“…n works [1,2] , the results of studying the kinetics of processes in a heterogeneous plasma based on mixed flows of a buffer gas -argon, an oxidizer (water molecules), and aluminum dust are presented. Plasma of various types of discharge (glow, pulsed and combined) in gas-vapor mixtures of argon, water, and aluminum dust was studied.…”

mentioning

confidence: 99%

Study of the Formation Conditions of Aluminum Oxide Nanoparticles in an Overstressed Nanosecond Discharge Between Aluminum Electrodes in a Mixture of Nitrogen and Oxygen

Шуаибов

Minya

Малинина

et al. 2020

j. of met. mater. res.

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The results of the study of oscillograms of voltage, current, pulsed electric power and energy input into the plasma of an overstressed nanosecond discharge between aluminum electrodes in argon and mixtures of nitrogen with oxygen (100-1) at pressures in the range of 13.3-103.3 kPa are presented, the emission plasma spectra are studied. It is shown that in mixtures of nitrogen with oxygen at atmospheric pressure, nanoparticles of aluminum oxide (Al2O3) are formed, the luminescence of which manifests itself in the spectral range of 200-600 nm and which is associated with the formation of F-, F + - centers and more complex aggregate formations based on oxygen vacancies. Calculations of the electron-kinetic coefficients of plasma, transport characteristics, such as mean electron energies in the range 5.116-13.41 eV, are given. The electron concentration was 1.6 ∙ 1020 m-3 - 1.1 ∙ 1020 m-3 at a current density of 5.1 ∙ 106 A / m2 and l. 02 ∙ 107 A / m2 on the surface of the electrode of the radiation source (0.196 · 10-4 m2). Also drift velocities, temperatures and concentrations of electrons, specific losses of the discharge power for elastic and inelastic processes of collisions of electrons per unit of the total concentration of the mixture from the reduced electric field strength (E / N) for a mixture of aluminum, nitrogen, oxygen, rate constants of collisions of electrons with aluminum atoms on the E / N parameter in plasma on a mixture of aluminum vapor, oxygen and nitrogen = 30: 1000: 100000 Pa at a total mixture pressure of P = 101030 Pa are given.

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Spectral and kinetic analysis of heterogeneous gas discharge plasma in the flow of an Al, H2O, and Ar mixture

Cited by 14 publications

References 7 publications

Synthesis of aluminum oxide nanoparticles in overstressed nanosecond discharge plasma with the ectonic sputtering mechanism of aluminum electrodes

Synthesis of aluminum oxide nanoparticles in overstressed nanosecond discharge plasma with the ectonic sputtering mechanism of aluminum electrodes

Characteristics and parameters of plasma of a gas-discharge UV–VUV lamp on a system of bands of argon chloride and chlorine molecules

Study of the Formation Conditions of Aluminum Oxide Nanoparticles in an Overstressed Nanosecond Discharge Between Aluminum Electrodes in a Mixture of Nitrogen and Oxygen

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